In:
Advanced Materials Research, Trans Tech Publications, Ltd., Vol. 415-417 ( 2011-12), p. 1871-1874
Abstract:
Aluminium doped ZnO (ZnO:Al) films were deposited on polymer substrates by RF magnetron sputtering. The effects of deposition temperatures on structure and properties of films were investigated by X-ray diffractometery, Scanning electronic microscopy, UV-visible spectrophotometer, as well as Four-point Probes System. The results revealed that moderate deposition temperature was helpful to improve the crystal quality and optoelectronic properties of ZnO:Al films. The lowest resistivity of 9.5×10 -3 Ω•cm and the average transmittance of 76% in the visible region was obtained for the film deposited from ZnO:2wt% Al 2 O 3 target at 75°C.
Type of Medium:
Online Resource
ISSN:
1662-8985
DOI:
10.4028/www.scientific.net/AMR.415-417
DOI:
10.4028/www.scientific.net/AMR.415-417.1871
Language:
Unknown
Publisher:
Trans Tech Publications, Ltd.
Publication Date:
2011
detail.hit.zdb_id:
2265002-7
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