In:
Surface and Interface Analysis, Wiley, Vol. 46, No. 8 ( 2014-08), p. 544-549
Abstract:
Degradation behaviors of poly(3‐hexylthiophene‐2,5‐diyl) (P3HT) layers on NiO in the presence of H 2 O at ambient pressure and dark conditions were studied using X‐ray photoelectron spectroscopy (XPS). Upon H 2 O exposure at 120 °C, partial oxidation of P3HT together with molecular water incorporation, but with the maintained local ring‐structure, were deduced by XPS. Valence band spectra of XPS evidenced that the partial oxidation of P3HT local structure could alter π ‐conjugation systems of P3HT layers, forming additional electronic states close to its original highest occupied molecular orbital. For comparison, P3HT surface was also exposed to O 2 , and no change in the S 2p and C 1s spectra was found by O 2 exposure at 120 °C, implying that H 2 O plays a major role at the initial stage of P3HT oxidation. Copyright © 2014 John Wiley & Sons, Ltd.
Type of Medium:
Online Resource
ISSN:
0142-2421
,
1096-9918
Language:
English
Publisher:
Wiley
Publication Date:
2014
detail.hit.zdb_id:
2023881-2
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