In:
Modern Physics Letters B, World Scientific Pub Co Pte Ltd, Vol. 34, No. 07n09 ( 2020-03-30), p. 2040021-
Kurzfassung:
Since semiconductor technology has been progressing, an approach to precise size control of the devices becomes a main challenge. In this work, a programmable logic controller module was used to read the sputtering parameters in real time. Experimental results confirmed that the direct current (DC) bias increased with increasing sputtering power. At the same time, the non-uniformity of the deposited films also increased along with the increasing power. However, the film thickness difference caused by plasma turbulence decreased with increasing deposition time. In addition, it was difficult to evaluate the local uniformity of the film by using the DC bias.
Materialart:
Online-Ressource
ISSN:
0217-9849
,
1793-6640
DOI:
10.1142/S0217984920400217
Sprache:
Englisch
Verlag:
World Scientific Pub Co Pte Ltd
Publikationsdatum:
2020
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