In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 40, No. 1R ( 2001-01-01), p. 332-
Abstract:
High-resolution CN(B 2 Σ + –X 2 Σ + ) and CH(A 2 Δ–X 2 Π) emission spectra were observed for the dissociative excitation reaction of CH 3 CN with the microwave-discharge flow of Ar for synthesizing hydrogenated amorphous carbon nitride ( a -CN x :H) films. The simulation analysis of these spectra revealed that the relative number density of CH(A) to that of CN(B), N CH(A) / N CN(B) , was strongly dependent on the pressure of Ar, P Ar , in the range of P Ar =0.1–0.8 Torr. The P Ar -dependence of N CH(A) / N CN(B) showed a strongly negative correlation with that of the [N]/([N] +[C]) ratio obtained in our previous structural analysis of the films [Saitoh et al. : Jpn. J. Appl. Phys. 39 (2000) 1258]. This correlation was fully explained in terms of the consumption of the CN radical by the hydrogen-abstraction reaction from the film surface, preventing the incorporation of the nitrogen atoms into the a -CN x :H films.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
2001
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
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