In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 44, No. 2R ( 2005-02-01), p. 865-
Abstract:
We report a simple method for realizing the direct lithographic patterning of metallic silver and its alloy from amorphous films of photosensitive silver organometallic compounds. In this process, ultraviolet (UV) light was used to selectively activate organometallic compounds, converting organometallic compounds to metallic states in illuminated regions. The photolysis process was monitored by FTIR spectroscopy and the products were analyzed by UV–visible light spectrometry, X-ray photoelectron spectroscopy (XPS), and X-ray diffraction analysis (XRD). A feature size of 5 µm was demonstrated through the process.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
2005
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
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