In:
Applied Physics Letters, AIP Publishing, Vol. 102, No. 24 ( 2013-06-17)
Abstract:
By combining classical and ab-initio simulations, we generated a structural model of an amorphous silicon nitride/silicon(100) interface and we investigated its electronic and dielectric properties from first principles. We computed the valence band offset using many-body perturbation theory, within the GW approximation, and we found results in good agreement with experiments. Based on the computed local band edges and dielectric constants, we estimate that bulk properties are recovered for nitride films with thickness larger than 6–7 Å.
Type of Medium:
Online Resource
ISSN:
0003-6951
,
1077-3118
Language:
English
Publisher:
AIP Publishing
Publication Date:
2013
detail.hit.zdb_id:
211245-0
detail.hit.zdb_id:
1469436-0
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