In:
Pure and Applied Chemistry, Walter de Gruyter GmbH, Vol. 74, No. 3 ( 2002-01-01), p. 471-474
Abstract:
Plasma sputter deposition is introduced in the field of catalyst preparation. It is shown that growth kinetics and morphologies are determined by ion to neutral flux ratio and kinetic energies of sputtered atoms. Catalytic activity of such catalysts compares very well with classical catalysts.
Type of Medium:
Online Resource
ISSN:
1365-3075
,
0033-4545
DOI:
10.1351/pac200274030471
Language:
English
Publisher:
Walter de Gruyter GmbH
Publication Date:
2002
detail.hit.zdb_id:
2022101-0
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