ISSN:
1572-8986
Keywords:
Langmuir probe
;
rf glow discharge
Source:
Springer Online Journal Archives 1860-2000
Topics:
Chemistry and Pharmacology
,
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
,
Technology
Notes:
Abstract The current-voltage characteristics of Langmuir probes in rf glow discharges can be misinterpreted by the effects of rf time averaging, ionization near a probe, and expansion of the probe sheath. This paper presents a new Langmuir probe technique which can be used to determine the plasma parameters in rf glow discharges. Simple expressions for the time averaged I-V characteristics are derived for the cases of fully sinusoidal and partially rectified plasma potential waveforms. Examples of corresponding I-V characteristics obtained from argon rf glow discharges are also illustrated.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1007/BF01016929
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