In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 38, No. 10A ( 1999-10-01), p. L1131-
Abstract:
Amorphous carbon nitride (a-C:N) thin films were synthesized by means of shielded arc ion plating using a graphite target and pure nitrogen gas. The mechanical properties and chemical structures of these a-C:N films were studied through nanoindentation and X-ray photoelectron spectroscopic analysis. Nanohardness of the a-C:N film prepared at a substrate bias voltage of 0 V was ≈10 GPa. It was increased to 13–14 GPa when the substrate was biased negatively in the range of -100 to -500 V. The a-C:N film prepared at a bias of -300 V was particularly wear-resistant such that the film did not wear at all when rubbed with a diamond tip at a contact force of 20 µN. This highly wear-resistant a-C:N film was found to contain almost equal amounts of two C-N phases: β-C 3 N 4 -like and graphitelike phases.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.38.L1131
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
1999
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
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