In:
Materials Research Express, IOP Publishing, Vol. 9, No. 2 ( 2022-02-01), p. 026403-
Abstract:
Molybdenum carbide (Mo 2 C) films were prepared using pulsed direct-current (DC) magnetron sputtering. The effects of film thickness on the phase structure, surface morphology, and optical constants of the films were examined using X-ray diffraction (XRD), atomic force microscopy, and extreme ultraviolet reflectivity. XRD analysis showed that the as-sputtered films with thicknesses between 30 nm and 150 nm were almost amorphous. New phase α -MoC 1-x with the (111), (200), (220), (311), and (222) crystal planes appeared in films with thicknesses between 200 nm and 400 nm. The phase transition and chemical composition of the Mo 2 C films treated using vacuum heat treatment were analyzed in detail. For 150 nm-thick films, the as-deposited as well as the 600 °C-annealed films were amorphous. The phase structures of the 150 nm-thick film annealed at 700 °C, 750 °C, and 800 °C were orthogonal Mo 2 C ( α –Mo 2 C), multiphase structure ( β –Mo 2 C, monoclinic MoO 2 , and cubic Mo 2 N), and monoclinic MoO 2 , respectively. X-ray photoelectron spectrometry revealed that the Mo-Mo bonds of the films transformed into Mo-C, Mo-O, and Mo-N bonds under 750 ℃-annealing, further confirming the formation of a multiphase structure after annealing. Thus, film thickness and annealing temperature considerably influence the properties of Mo 2 C films.
Type of Medium:
Online Resource
ISSN:
2053-1591
DOI:
10.1088/2053-1591/ac513e
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
2022
detail.hit.zdb_id:
2760382-9
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