In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 52, No. 11S ( 2013-11-01), p. 11NB06-
Abstract:
In this study, we investigated the electrochemical characteristics of TiN/ZrN multilayers on a Ti–35Ta– x Hf alloy by radio frequency (RF) magnetron sputtering. The Ti–35Ta– x Hf alloy had an α''+ β phase structure. The Ti–35Ta–15Hf alloy had a higher intensity β phase peak than Ti–35Ta–3Hf and 7Hf alloy, which contained lower Hf content. The martensite traces disappeared with increasing Hf content and the Ti–35Ta–15Hf alloy showed an entirely equiaxed structure with a β phase. The multilayer film was developed by alternately depositing TiN and ZrN layers on Ti–35Ta–15Hf substrates using the RF magnetron sputtering system to improve the interface properties between the coating and substrate. The uncoated specimen showed a passive region between 60 and 1300 mV with a current density of 0.38 µA/cm 2 , whereas, the TiN/ZrN multilayered specimen had a passive region between 210 and 1500 mV with a current density of 0.09 µA/cm 2 . The experimental results suggest that the as-sputtered layer coated well on the substrate. The TiN/ZrN multilayered film on Ti–35Ta–15Hf substrate exhibited better electrochemical resistance than that of the uncoated Ti–35Ta–15Hf substrate.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.7567/JJAP.52.11NB06
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
2013
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
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