In:
Beilstein Journal of Nanotechnology, Beilstein Institut, Vol. 3 ( 2012-12-19), p. 884-892
Abstract:
Patterning of materials at sub-10 nm dimensions is at the forefront of nanotechnology and employs techniques of various complexity, efficiency, areal scale, and cost. Colloid-based patterning is known to be capable of producing individual sub-10 nm objects. However, ordered, large-area nano-arrays, fully integrated into photonic or electronic devices have remained a challenging task. In this work, we extend the practice of colloidal lithography to producing large-area sub-10 nm point-contact arrays and demonstrate their circuit integration into spin-photo-electronic devices. The reported nanofabrication method should have broad application areas in nanotechnology as it allows ballistic-injection devices, even for metallic materials with relatively short characteristic relaxation lengths.
Type of Medium:
Online Resource
ISSN:
2190-4286
Language:
English
Publisher:
Beilstein Institut
Publication Date:
2012
detail.hit.zdb_id:
2583584-1
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