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  • American Vacuum Society  (5)
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  • American Vacuum Society  (5)
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  • 1
    Online Resource
    Online Resource
    Wet oxidation of AlAs films under ultrahigh vacuum conditions
    American Vacuum Society ; 1997
    In:  Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena Vol. 15, No. 4 ( 1997-07-01), p. 1182-1186
    Details
    In: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, American Vacuum Society, Vol. 15, No. 4 ( 1997-07-01), p. 1182-1186
    Abstract: The initial stages of oxidation of AlAs(001) (using D2O as the oxidant) have been investigated using Auger electron spectroscopy and temperature-programmed desorption. We have found that molecularly adsorbed water on AlAs(001) has two competing reaction pathways available: either desorption back into the gas phase, or dissociation resulting in aluminum oxide, aluminum hydroxide, and arsenic hydride. Recombination of the arsenic hydride produces arsine, which desorbs and depletes arsenic within the oxide film, a process which is shown to enhance the oxide growth. By identifying the various reaction steps that occur (with annealing) after the low-temperature adsorption of water on AlAs(001), we are able to propose a mechanism for the initial stages of wet AlAs oxidation.
    Type of Medium: Online Resource
    ISSN: 1071-1023 , 1520-8567
    URL: Article
    DOI: 10.1116/1.589435
    RVK:
    UA 4922
    Language: English
    Publisher: American Vacuum Society
    Publication Date: 1997
    detail.hit.zdb_id: 3117331-7
    detail.hit.zdb_id: 3117333-0
    detail.hit.zdb_id: 1475429-0
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    Online Resource
  • 2
    Online Resource
    Online Resource
    Multilayer oxidation of AlAs by thermal and electron beam induced decomposition of H2O in ultrahigh vacuum
    American Vacuum Society ; 1998
    In:  Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena Vol. 16, No. 4 ( 1998-07-01), p. 2199-2203
    Details
    In: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, American Vacuum Society, Vol. 16, No. 4 ( 1998-07-01), p. 2199-2203
    Abstract: The oxidation of AlAs by the decomposition of water has been investigated in ultrahigh vacuum using high-resolution electron energy loss spectroscopy, Auger electron spectroscopy, and temperature-programmed desorption. Significant oxidation of the AlAs near-surface region was observed after a single adsorption/anneal cycle in which multilayers ( & gt;10 monolayers) of water, adsorbed at 100 K, were annealed to above room temperature. Sputter profiling shows that repeated cycles of multilayer water exposure at 100 K followed by annealing results in a surface oxide that is at least 20–30 Å thick. The extent of surface oxidation, as measured by Auger electron spectroscopy, is not affected by annealing to 700 K. However, at temperatures in excess of 800 K, diffusion of subsurface AlAs to the oxide surface was observed. Moreover, it was found that irradiating a partially oxidized AlAs surface with a 3 keV electron beam for sufficiently long times would significantly increase the extent of surface oxidation.
    Type of Medium: Online Resource
    ISSN: 1071-1023 , 1520-8567
    URL: Article
    DOI: 10.1116/1.590148
    RVK:
    UA 4922
    Language: English
    Publisher: American Vacuum Society
    Publication Date: 1998
    detail.hit.zdb_id: 3117331-7
    detail.hit.zdb_id: 3117333-0
    detail.hit.zdb_id: 1475429-0
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    Online Resource
  • 3
    Online Resource
    Online Resource
    Observation of the reaction of gas-phase atomic hydrogen with Ru(001)- p (1×2)-O at 100 K
    American Vacuum Society ; 1994
    In:  Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films Vol. 12, No. 4 ( 1994-07-01), p. 2210-2214
    Details
    In: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, American Vacuum Society, Vol. 12, No. 4 ( 1994-07-01), p. 2210-2214
    Abstract: The interaction of gas-phase atomic hydrogen with chemisorbed oxygen on Ru(001) has been investigated with high-resolution electron energy loss spectroscopy. As gas-phase hydrogen atoms impinge on the p(1×2) oxygen overlayer at surface temperatures below 100 K, water is formed, a reaction which has not been observed in previous studies of coadsorbed hydrogen and oxygen on Ru(001). The water molecules which are produced exist as adsorbed monomers initially but form clusters at greater extents of reaction. Since this reaction occurs at low surface temperatures, an Eley–Rideal-like mechanism is suggested in which hydrogen atoms from the gas phase react with adsorbed oxygen before being thermally accommodated to the surface. More than 50% of the saturation coverage of oxygen can be removed by means of gas-phase atomic hydrogen. Complete removal of the oxygen overlayer is inhibited by the water that is produced in the reaction.
    Type of Medium: Online Resource
    ISSN: 0734-2101 , 1520-8559
    URL: Article
    DOI: 10.1116/1.579116
    RVK:
    UA 4921
    Language: English
    Publisher: American Vacuum Society
    Publication Date: 1994
    detail.hit.zdb_id: 1475424-1
    detail.hit.zdb_id: 797704-9
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  • 4
    Online Resource
    Online Resource
    Calibration of type-C thermocouples to liquid helium temperature
    American Vacuum Society ; 1993
    In:  Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films Vol. 11, No. 6 ( 1993-11-01), p. 3133-3134
    Details
    In: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, American Vacuum Society, Vol. 11, No. 6 ( 1993-11-01), p. 3133-3134
    Type of Medium: Online Resource
    ISSN: 0734-2101 , 1520-8559
    URL: Article
    DOI: 10.1116/1.578462
    RVK:
    UA 4921
    Language: English
    Publisher: American Vacuum Society
    Publication Date: 1993
    detail.hit.zdb_id: 1475424-1
    detail.hit.zdb_id: 797704-9
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    Online Resource
  • 5
    Online Resource
    Online Resource
    Dissociative chemisorption of oxygen on the Ru(001) surface: Spectroscopic identification of precursor intermediates at low surface temperatures
    American Vacuum Society ; 1994
    In:  Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films Vol. 12, No. 4 ( 1994-07-01), p. 2250-2254
    Details
    In: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, American Vacuum Society, Vol. 12, No. 4 ( 1994-07-01), p. 2250-2254
    Abstract: The adsorption of oxygen on the Ru(001) surface at 30 K has been investigated by high-resolution electron energy loss spectroscopy. Dissociative chemisorption occurs up to the saturation atomic coverage [ν⊥(Ru–O)=595 cm−1], after which a small amount of a molecularly chemisorbed peroxide species was isolated [ν(O–O)=790 cm−1] . After saturation of these atomic and molecularly chemisorbed states, physically adsorbed oxygen with a vibrational frequency close to the gas phase value of 1555 cm−1 was observed. The physically adsorbed oxygen was found to exhibit a resonance in the electron scattering cross section at an electron beam energy of about 5.5 eV. Heating the surface to 55 K leads to desorption of the physically adsorbed overlayer. The peroxide species, on the other hand, dissociates between 100 and 450 K. Although the initial precursors to dissociative chemisorption were not isolated, the peroxide identifies an intermediate precursor state, and the physically adsorbed oxygen identifies an extrinsic precursor state.
    Type of Medium: Online Resource
    ISSN: 0734-2101 , 1520-8559
    URL: Article
    DOI: 10.1116/1.579124
    RVK:
    UA 4921
    Language: English
    Publisher: American Vacuum Society
    Publication Date: 1994
    detail.hit.zdb_id: 1475424-1
    detail.hit.zdb_id: 797704-9
    Location Call Number Limitation Availability
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    Online Resource
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