In:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, American Vacuum Society, Vol. 33, No. 3 ( 2015-05-01)
Abstract:
The authors report about accurate monitoring of ultralow La doses inserted in advanced high-k/metal gate stacks for threshold voltage tuning purposes. Three characterization techniques are implemented for precise and reproducible lanthanum quantification. Low energy electron x-ray emission spectrometry capabilities are highlighted in terms of sensitivity and accuracy, thanks to a comparison with reference results obtained by Rutherford Backscattering Spectrometry. The capabilities of state-of-the-art Auger nanoprobes for depth profiling in the subnanometer range are also illustrated.
Type of Medium:
Online Resource
ISSN:
2166-2746
,
2166-2754
Language:
English
Publisher:
American Vacuum Society
Publication Date:
2015
detail.hit.zdb_id:
3117331-7
detail.hit.zdb_id:
1475429-0
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