In:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, American Vacuum Society, Vol. 22, No. 6 ( 2004-11-01), p. 3323-3326
Abstract:
Templates for imprint lithography and MxL (molecular transfer lithography) are generated by adhesion of a spin-cast film of polyvinyl alcohol (PVA) to a carrier comprised of materials selected for conformability or distortion reduction. Template formation using both polymeric carrier materials and rigid materials, including quartz and glass carrier materials, is demonstrated. The absence of a carrier material altogether to form a suspended thin film is shown to be feasible. The rigid template material is formed by bonding the PVA patterned film to a rigid carrier while still connected to the master pattern, and it is demonstrated that separation occurs at the PVA-silicon master pattern interface. Form factors for the templates include a 25mm×25mm patterned film attached to a 65mm×65mm glass substrate, a full 100 mm pattern bonded to a quartz substrate, and a 100 mm mask of Mylar™ bonded with a patterned PVA film for MxL applications. These carrier materials are developed in a form factor compatible with commercial nanoimprint lithography tools, and for standard contact aligners adapted to perform MxL processing.
Type of Medium:
Online Resource
ISSN:
1071-1023
,
1520-8567
Language:
English
Publisher:
American Vacuum Society
Publication Date:
2004
detail.hit.zdb_id:
3117331-7
detail.hit.zdb_id:
3117333-0
detail.hit.zdb_id:
1475429-0
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