In:
Journal of Nanoscience and Nanotechnology, American Scientific Publishers, Vol. 15, No. 10 ( 2015-10-01), p. 8099-8102
Kurzfassung:
In this study, we investigated Ti-doped ITO films formed through ionized physical vapor deposition (IPVD) using inductively coupled plasma (ICP). Ti-doped ITO thin films showed an enhanced mobility with ICP power; owing to the improved crystallinity, and the sheet resistance of the Ti-doped ITO (30 nm) largely decreased from 295.1 to 134.5 ohm/sq, even during at room temperature. Therefore, IPVD technology offers a useful tool for transparent electrodes with a large area window-unified touch-screen panel.
Materialart:
Online-Ressource
ISSN:
1533-4880
DOI:
10.1166/jnn.2015.11289
Sprache:
Englisch
Verlag:
American Scientific Publishers
Publikationsdatum:
2015
SSG:
11
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