Electronic Resource
Woodbury, NY
:
American Institute of Physics (AIP)
Applied Physics Letters
74 (1999), S. 1794-1796
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
We discuss the design and fabrication of an all-dielectric thin-film polarizer that is compatible with existing planar technologies. This polarizer consists of a stack of quarter-wave biaxial layers. Each quarter-wave layer is formed by reactive electron-beam evaporation, using a bideposition technique that causes a columnar structure to grow perpendicular to the substrate, produces large normal-incidence linear birefringence, and avoids thickness wedging that is inherent in tilted-columnar biaxial layers. p-polarized light that is incident on the polarizer encounters an index-matched stack and is transmitted, whereas s-polarized light is rejected by a coexisting high-reflectance stack. A fabrication figure-of-merit of ten film periods per decade in the extinction ratio has been achieved in practice for a titanium oxide/tantalum oxide polarizer. © 1999 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.123088
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