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  • American Institute of Physics (AIP)  (25)
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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 69 (1991), S. 6500-6505 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: There is a need for semiconductor junctions with very low leakage for energy conversion from low level radioactive or radio-luminescent sources, and low noise blue-green photodiodes. We report the properties of two types of GaP junctions; a Schottky barrier of Pd on liquid phase epitaxy grown n-type GaP and a p+ over n junction grown by metal-organic chemical vapor deposition. Both types of junctions show very low leakage currents and good efficiency for power conversion from low level beta particles, x rays, and blue-green light.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 58 (1991), S. 1360-1362 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We report measurements of optical scatter in epitaxial semiconductor multilayer structures. The structures comprise quarter-wave layers of Al0.2Ga0.8As/AlAs and GaAs/AlAs grown by molecular beam epitaxy and Al0.2Ga0.8As/AlAs grown by metalorganic chemical vapor deposition to assess differences due to growth technique and layer composition. The bidirectional reflective distribution function (BRDF) is measured at a wavelength of 835 nm corresponding closely to the Bragg reflection condition of the multilayer. The BRDF measurement yields calculated values for the total integrated scatter and effective surface roughness. The former is in the range 7×10−4–5×10−3 while the latter is typically 3–16 A(ring) over the spatial frequency range 3×10 −2–1 μm−1. Both growth techniques yield comparable scatter loss on average, but there are significant differences in microscopic surface morphology, uniformity of scatter across the wafer, and lower limits of scatter. The measurements have significant implications for applications such as surface-emitting laser technology.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 57 (1990), S. 578-580 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A first principles total energy self-consistent pseudopotential calculation is used to predict the band offset in the lattice-matched superlattice InAs/Al0.8Ga0.2As0.14Sb0.86. We find that inclusion of interface strain changes the character of the band offset from nominally type II to strongly type II. The predicted band offset at the minimum energy configuration is in excellent agreement with the value determined from infrared photoluminescence measurements.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 55 (1989), S. 666-668 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Cyclotron resonance of the two-dimensional hole gas (2DHG) in the strained-layer quantum well structure of In0.20Ga0.80As/GaAs is observed in far-infrared transmission measurements made at 4.2 K. The cyclotron mass of the 2DHG in the In0.20Ga0.80As channel is (0.191±0.008)me for a 2D hole density p2D =8.5×1011/cm2.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 51 (1987), S. 1004-1006 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We report accurate determination of the critical layer thickness (CLT) for single strained-layer epitaxy in the InGaAs/GaAs system. Our samples were molecular beam epitaxially grown, selectively doped, single quantum well structures comprising a strained In0.2Ga0.8As layer imbedded in GaAs. We determined the CLT by two sensitive techniques: Hall-effect measurements at 77 K and photoluminescence microscopy. Both techniques indicate a CLT of about 20 nm. This value is close to that determined previously (∼15 nm) for comparable strained-layer superlattices, but considerably less than the value of ∼45 nm suggested by recent x-ray rocking-curve measurements. We show by a simple calculation that photoluminescence microscopy is more than two orders of magnitude more sensitive to dislocations than x-ray diffraction. Our results re-emphasize the necessity of using high-sensitivity techniques for accurate determination of critical layer thicknesses.
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 57 (1990), S. 2321-2323 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have quantified unintentional indium incorporation in GaAs grown by molecular beam epitaxy in a variety of commercial systems. We find that the unintentional indium density in the epitaxial GaAs is more a function of mounting technique and prior machine history than of the manufacturer's design. The indium densities detected in the epitaxial GaAs for substrates that only partially obscure an indium-bearing mount are equal to levels reported to result in minimum defect densities and narrowest photoluminescence linewidths in In-doped GaAs.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 56 (1990), S. 1242-1244 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Epitaxial films of AlAs0.16Sb0.84 and Al0.8Ga0.2As0.14Sb0.86 were grown lattice matched on (100) InAs substrates by molecular beam epitaxy. The material was characterized by x-ray diffraction, 4 K photoluminescence, and capacitance-voltage measurement techniques. At 300 K, background acceptor concentrations of 1.8×1015 and 1.4×1016 cm−3 were determined for the unintentionally doped AlAsSb and AlGaAsSb epitaxial layers, respectively. Compensating the AlAsSb and AlGaAsSb epitaxial layers with sulfur doping resulted in high-resistivity material with an effective donor concentration of about 1014 and 1015 cm−3, respectively.
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 55 (1989), S. 1118-1120 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We report the electrical chracterization of an InAs/AlAsSb quantum well heterostructure capacitor fabricated on material grown by molecular beam epitaxy. Hysteresis associated with electron storage was observed in the capacitance-voltage data from which we derived exponential charge decay constants of 50 s at 77 K.
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 53 (1988), S. 1098-1100 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We report electrical transport and optical studies of the efficiency with which an In0.2Ga0.8As/GaAs strained-layer superlattice (SLS) can filter threading dislocations generated in a thick In0.1 Ga0.9 As layer grown on GaAs. The electrical studies, the first of their kind, rely on a novel test structure which allows electrical characterization of just the top portion of the SLS, with the bottom portion acting as the dislocation filter. For optical characterization we detect dislocations directly by photoluminescence microscopy. The electrical results show that ∼3–6 periods of filtering are needed to attain high mobilities. The photoluminescence microimages show a small density of dislocations near the top of an eight-period SLS but no dislocations for 11 or more periods. Filtering with In0.2Ga0.8As/GaAs SLS's is more effective than with GaAs0.8P0.2/GaAs SLS's, possibly because of larger interlayer differences in strain and elastic constants for the former.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 52 (1988), S. 377-379 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The critical layer thickness for InxGa1−xAs layers in InxGa1−xAs/GaAs single strained quantum wells (SSQW's) and strained-layer superlattices (SLS's) are investigated. Photoluminescence microscopy (PLM) images and x-ray rocking curves for two series of SSQW and SLS structures corresponding to many different layer thicknesses were obtained. We find that the PLM technique, which directly images dislocations and is sensitive to low dislocation densities, is much more suitable for determining the onset of dislocation creation. The x-ray technique can detect lattice relaxation by dislocations but only at relatively high densities of dislocations. Using the former technique, we determine critical thicknesses of 190 A(ring) for SSQW's and 250 A(ring) for SLS's with x≈0.2. These results are near the theoretical predictions of J. W. Matthews, S. Mader, and T. B. Light [J. Appl. Phys. 41, 3800 (1970)] (150 and 300 A(ring), respectively) and are much lower than results obtained by x-ray or other techniques which sense lattice relaxation.
    Type of Medium: Electronic Resource
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