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  • 1
    Digitale Medien
    Digitale Medien
    College Park, Md. : American Institute of Physics (AIP)
    Journal of Mathematical Physics 27 (1986), S. 1093-1098 
    ISSN: 1089-7658
    Quelle: AIP Digital Archive
    Thema: Mathematik , Physik
    Notizen: The critical values of coupling for the Bassichis–Foldy model are explained. For a finite number of bosons N they are associated with changes in the bounded above and below properties of the Hamiltonian. Exact N → ∞ spectral properties are obtained using continued fractions and a duality in terms of competing Bogoliubov-type limits is exhibited. The critical coupling limits are then associated with transitions from either a discrete to a continuous spectrum or from one Bogoliubov-type limit to another.
    Materialart: Digitale Medien
    Standort Signatur Einschränkungen Verfügbarkeit
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  • 2
    Digitale Medien
    Digitale Medien
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 82 (1997), S. 1632-1639 
    ISSN: 1089-7550
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: X-ray photoelectron spectroscopy (XPS) has been used to characterize the thin thermal oxide film grown on single crystal CdSe(0001) and polycrystalline CdSe by exposure to O2 (dry air) at 350 °C. SeOx species, where x=2,3, are clearly identified by a 5 eV shift of the Se 3d3/2,5/2 peaks to higher binding energy. A very weak shift to lower binding energy is observed for the Cd peaks. The positions of the Cd and O peaks do not match those found for the known cadmium oxides, CdO and CdO2. Instead, it is proposed that the Cd bound oxygen atoms occupy substitutional Se sites. The presence of Cd bound oxygen can also be inferred from the intensities of the SeOx, Cd, and O peaks. Raman spectroscopy confirms the existence of O in Se substitutional sites. Angle-resolved XPS is used to determine the thickness of the oxide and the relative amount of SeOx and Cd bound oxygen. The XPS data are consistent with an 8–9 Å thick oxide where ∼60% of the oxygen is bound to Se and ∼40 is bound to Cd. The data show that the oxide structure contains two layers; a passivation layer made of the SeOx species and, underneath, a layer containing oxygen in Se substitutional sites. © 1997 American Institute of Physics.
    Materialart: Digitale Medien
    Standort Signatur Einschränkungen Verfügbarkeit
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  • 3
    Digitale Medien
    Digitale Medien
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 84 (1998), S. 4911-4920 
    ISSN: 1089-7550
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: The chemistry occurring at the CdSe/Si, CdSe/SiO, and CdSe/SiO2 interfaces was investigated by looking at very thin tapered films (0–10 nm) of thermally evaporated CdSe with x-ray photoelectron spectroscopy. The analysis of the attenuation of the x-ray photoelectron signals along the tapered film was used to measure the electron mean free paths in as-deposited CdSe. The electron mean free path was found to increase with the photoelectron energy from 1.5 nm at 720 eV to 2.3 nm at 1200 eV. Our data suggest an island growth mechanism for CdSe on the Si substrate and a more uniform growth on silicon oxide. In the early growth, Se is first adsorbed on the surface creating sites where Cd subsequently adsorbs. Interdiffusion is observed for CdSe on the Si and SiO substrates after a vacuum anneal at 390 °C. The main result of this interdiffusion process is the formation of Si–Se bonds. Similar interdiffusion processes on thermal SiO2 substrates are expected but were too small to be detected.
    Materialart: Digitale Medien
    Standort Signatur Einschränkungen Verfügbarkeit
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