GLORIA

GEOMAR Library Ocean Research Information Access

Your email was sent successfully. Check your inbox.

An error occurred while sending the email. Please try again.

Proceed reservation?

Export
  • 1
    In: Acta Physica Sinica, Acta Physica Sinica, Chinese Physical Society and Institute of Physics, Chinese Academy of Sciences, Vol. 68, No. 18 ( 2019), p. 187104-
    Abstract: The doping is one of important means in the semiconductor manufacturing techniques, by which the optical and electric properties of semiconductor materials can be significantly improved. The doping level and energy level structure of dopants have a great influence on the operating performances of micro-electronic devices. Beryllium is one of acceptors, which is frequently used to be doped in GaAs bulk, because it is very stable with respect to diffusion at higher temperatures. Therefore, it is significant for the application to optoelectronic devices that the energy-state structure of Be acceptors in GaAs bulk can be investigated in detail. The sample GaAs:Be used in experiment is a 5-μm-thick epitaxial single layer doped uniformly by Be acceptors with a doping level of 2 × 10〈sup〉16〈/sup〉 cm〈sup〉–3〈/sup〉, and grown by molecular beam epitaxy on 450-μm-thick semi-insulating (100) GaAs substrates in a VG V80 H reactor equipped with all solid sources. The transitions between the energy states of Be acceptors are studied experimentally by different spectroscopy techniques. The far-infrared absorption experiments are performed by using a Fourier-transform spectrometer equipped with a tungsten light source and a multilayer wide band beam splitter. Prior to the absorption spectrum measurement, the sample is thinned, polished and wedged to approximately a 5° angle to suppress optical interference between the front and back faces. Then, the sample is placed into the cryostat with liquid helium (4.2 K). The photoluminescence and Raman spectra are also measured at 4.2 K by a Renishaw Raman imaging microscope. The optical excitation to the sample is provided by an argon-ion laser with a wavelength of 514.5 nm, and the excited power is typically 5 mW. The odd-parity transitions from the Be acceptor ground state 1S〈sub〉3/2〈/sub〉〈i〉Γ〈/i〉〈sub〉8〈/sub〉 to three excited states, i.e. 2P〈sub〉3/2〈/sub〉〈i〉Γ〈/i〉〈sub〉8〈/sub〉, 2P〈sub〉5/2〈/sub〉〈i〉Γ〈/i〉〈sub〉8〈/sub〉 and 2P〈sub〉5/2〈/sub〉〈i〉Γ〈/i〉〈sub〉7〈/sub〉 are clearly observed in the far-infrared absorption spectra, then the respective transition energy values are obtained, which are in excellent agreement with the experimental results reported previously. In the photoluminescence spectrum, the emission peak labelled two holetransition, originating from the two-hole transition of recombination of the neutral-accptor bound excitons, is seen obviously, thus the energy of the even-parity transition between 1S〈sub〉3/2〈/sub〉〈i〉Γ〈/i〉〈sub〉8〈/sub〉 and 2S〈sub〉3/2〈/sub〉〈i〉Γ〈/i〉〈sub〉8〈/sub〉 states is found indirectly. Furthermore, in the Raman spectrum measured, the transition peak between 1S〈sub〉3/2〈/sub〉〈i〉Γ〈/i〉〈sub〉8〈/sub〉 and 2S〈sub〉3/2〈/sub〉〈i〉Γ〈/i〉〈sub〉8〈/sub〉 states is well resolved, and the transition energy between them is gained directly. By comparison, the transition energy values gained directly and indirectly are found to be consistent with each other.
    Type of Medium: Online Resource
    ISSN: 1000-3290 , 1000-3290
    Language: Unknown
    Publisher: Acta Physica Sinica, Chinese Physical Society and Institute of Physics, Chinese Academy of Sciences
    Publication Date: 2019
    Location Call Number Limitation Availability
    BibTip Others were also interested in ...
  • 2
    In: Acta Physica Sinica, Acta Physica Sinica, Chinese Physical Society and Institute of Physics, Chinese Academy of Sciences, Vol. 64, No. 15 ( 2015), p. 154216-
    Abstract: A series of Ge-Se chalcogenide glasses incorporated with same molar percentage of Ga, Sn, Sb and Te are synthesized by melt-quenching method. The variations of optical band gaps doped with different elements are investigated by absorption spectra, and the relationship of optical band gap with glass network structure is studied by Raman spectra The results show that the doping of heavy metallic elements (except Ga) could reduce the optical band gap of the Ge-Se glass due to the decrease of the number of Se-Se chains or ring bonds. Third-order optical nonlinearities of the glasses are studied by femtosecond Z-scan method at a telecom wavelength of 1550nm. The results show that the performance of third-order optical nonlinearity of the Ge-Se glass could be improved by doping the above-mentioned elements. By comparison, the Sn-doped Ge-Se glass has a maximum nonlinear refraction index (n2) of 6.36× 10-17 m2/W and a figure of merit of over 23. By combining the experimental results from Raman spectra, the enhancement of third-order optical nonlinearity after the introduction of Sn can be ascribed to the formation of Sn(Se1/2)4 tetrahedra that enters into the main frame of Ge-Se glass and results in a stable Ge-Sn-Se network. Te doping could also remarkably enhance the n2 value of the Ge-Se glass, however, it could cause large two-photon absorption, leading to a poor value of figure of merit. The research result shows that chalcogenide glass in Ge-Sn-Se ternary system is an ideal candidate material for designing and fabricating infrared devices with high performance and environmental friendness.
    Type of Medium: Online Resource
    ISSN: 1000-3290 , 1000-3290
    Language: Unknown
    Publisher: Acta Physica Sinica, Chinese Physical Society and Institute of Physics, Chinese Academy of Sciences
    Publication Date: 2015
    Location Call Number Limitation Availability
    BibTip Others were also interested in ...
  • 3
    Online Resource
    Online Resource
    Acta Physica Sinica, Chinese Physical Society and Institute of Physics, Chinese Academy of Sciences ; 2016
    In:  Acta Physica Sinica Vol. 65, No. 16 ( 2016), p. 168502-
    In: Acta Physica Sinica, Acta Physica Sinica, Chinese Physical Society and Institute of Physics, Chinese Academy of Sciences, Vol. 65, No. 16 ( 2016), p. 168502-
    Abstract: Negative bias temperature instability (NBTI) is a p-channel metal-oxide-semiconductor (PMOS) degradation mechanism, which becomes one of the important reliability concerns. The NBTI drastically influences device performance and circuit lifetime. On the other hand, the circuit performance is also affected by the fabrication-induced process variation when the transistor size shrinks to a nanometer-scale. In the presence of the fabrication-induced random variations, the NBTI aging process and its influence on PMOS device become a random process. In this paper, the joint effects of NBTI and process variations on PMOS device are investigated. Firstly, the influence of process variation on NBTI aging is analyzed based on the reaction-diffusion (R-D) mechanism. The NBTI-induced PMOS threshold voltage degradation depends not only on stress time but also on fabrication-determined process parameters, such as the initial threshold voltage and oxide thickness. Then the statistical model is proposed to model NBTI-induced aging under process variation, which captures the threshold voltage variation and oxide thickness variation as random vectors with normal distributions. For 100-times Monte-Carlo simulation based on 65 nm technology, the voltage error and oxide thickness error of the PMOS device are obtained. Applying these process errors to the statistical model, the results show that mean value of threshold voltages is increased along the negative direction with the stress time going on under the process variation and NBTI effect interaction. Meanwhile the standard deviation of threshold voltage is reduced, which represents that the matching between those PMOS devices becomes better. The proposed statistical model accuracy is verified by R-D model theoretical solutions. The maximum relative error of the mean value and of the standard deviations for the threshold voltages degradation of the PMOS device are only 0.058% and 0.91% respectively in 104 s. The distribution characteristic of PMOS NBTI effect is more serious to analog circuit, because analog circuit is more sensitive to device mismatch. For current steering digital-to-analog converter (DAC), PMOS device is always adopted as current source due to its good isolating properties. The PMOS current source requires good matching, and mismatch error could cause circuit failure. To realize aging simulation on DAC circuit in Spectre environment, the above statistical NBTI model is realized by Verilog-ASM language as the subcircuit module to PMOS device. Finally, this module is applied to the current steering DAC. Considering the NBTI effect under process variations, the simulation results show that the DAC gain error is increased with the stress time going on, while its linearity error is gradually reduced.
    Type of Medium: Online Resource
    ISSN: 1000-3290 , 1000-3290
    Language: Unknown
    Publisher: Acta Physica Sinica, Chinese Physical Society and Institute of Physics, Chinese Academy of Sciences
    Publication Date: 2016
    Location Call Number Limitation Availability
    BibTip Others were also interested in ...
Close ⊗
This website uses cookies and the analysis tool Matomo. More information can be found here...