In:
Applied Physics Letters, AIP Publishing, Vol. 106, No. 16 ( 2015-04-20)
Abstract:
High hole concentration was achieved in Mg-doped AlxGa1−xN (x ∼ 0.4) by using indium-surfactant-assisted delta doping method. A maximum carrier concentration of 4.75 × 1018 cm−3 was obtained, which is three times higher than that of the conventionally delta-doped sample. Sheet resistivity as low as 2.46 × 104 Ω/sq was realized, benefiting from the high hole concentration (p). Analysis results show that the Mg incorporation is effectively enhanced, while the compensation ratio and acceptor activation energy (EA) are significantly reduced by using In surfactant. It was also found that the In surfactant may induce stronger valence-band modulation, contributing to the decrease of EA and the increase of p.
Type of Medium:
Online Resource
ISSN:
0003-6951
,
1077-3118
Language:
English
Publisher:
AIP Publishing
Publication Date:
2015
detail.hit.zdb_id:
211245-0
detail.hit.zdb_id:
1469436-0
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