In:
Journal of Applied Physics, AIP Publishing, Vol. 81, No. 10 ( 1997-05-15), p. 6729-6737
Abstract:
Electrical, optical, and structural properties of nitrogen-doped hydrogenated amorphous silicon films with the N content up to about 12 at. % are systematically studied using electrical conductivity measurements, electron-spin resonance, light-induced electron-spin resonance, constant photocurrent method, optical absorption spectrophotometry, IR absorption spectroscopy, Raman scattering spectroscopy, and x-ray photoelectron spectroscopy. Both behaviors of the dark conductivity and the charged-dangling-bond density against the N content suggest that most of charged dangling bonds originate from potential fluctuations. Only part of charged dangling bonds created by the N doping up to 2 at. % originate from positively charged fourfold-coordinated N. The decay behavior of the photoconductivity after turning off the probing light also supports that most of charged dangling bonds in N-doped hydrogenated amorphous silicon do not originate from positively charged fourfold-coordinated N. A possible origin of potential fluctuations is increased fluctuations in the net electron density at Si sites accompanying structural randomness caused by the N doping.
Type of Medium:
Online Resource
ISSN:
0021-8979
,
1089-7550
Language:
English
Publisher:
AIP Publishing
Publication Date:
1997
detail.hit.zdb_id:
220641-9
detail.hit.zdb_id:
3112-4
detail.hit.zdb_id:
1476463-5
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