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  • 1
    Online Resource
    Online Resource
    AIP Publishing ; 1991
    In:  Journal of Applied Physics Vol. 69, No. 9 ( 1991-05-01), p. 6699-6700
    In: Journal of Applied Physics, AIP Publishing, Vol. 69, No. 9 ( 1991-05-01), p. 6699-6700
    Abstract: The enhancement of Schottky barrier heights on InP substrate using a thin layer of phosphorus-nitride(P3N5), grown by a direct photochemical vapor deposition process with a gaseous mixture of PCl3 and NH3, has been studied. A Au-Schottky diode formed using the in situ processes has a 50-Å P3N5 intermediate layer showed a barrier height of 0.81 eV, an ideality factor of 1.08, and a reverse leakage current of 5.0 × 10−8 Å/cm2 at 1 V. The breakdown voltage was larger than 30 V. The thin-film/InP interface was investigated using x-ray photoelectron spectroscopy.
    Type of Medium: Online Resource
    ISSN: 0021-8979 , 1089-7550
    Language: English
    Publisher: AIP Publishing
    Publication Date: 1991
    detail.hit.zdb_id: 220641-9
    detail.hit.zdb_id: 3112-4
    detail.hit.zdb_id: 1476463-5
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  • 2
    Online Resource
    Online Resource
    AIP Publishing ; 2006
    In:  Applied Physics Letters Vol. 89, No. 20 ( 2006-11-13)
    In: Applied Physics Letters, AIP Publishing, Vol. 89, No. 20 ( 2006-11-13)
    Abstract: Organic single crystals have emerged as powerful tools for the exploration of the intrinsic charge transport properties of organic materials. To date, however, the limited number of fabrication techniques has forced a steep compromise between performance, reproducibility, range of feature sizes, gentle treatment of the single crystal, and facility of construction. Here the authors present a materials-general technique for the fabrication of single-crystal field-effect transistors with the use of a spin-coated elastomer gate dielectric and photolithographically defined source and drain electrodes. This allows the production of feature sizes and patterns previously impossible with reported elastomeric techniques yet yields devices with performance far superior to those fabricated on nonconformal dielectrics. The authors measure saturation-regime mobilities of 19.0 and 1.9cm2∕Vs for the semiconductors rubrene and pentacene, comparable to the best published values, and 2.4cm2∕Vs for tetracene, nearly double that previously reported. Device characteristics are indicative of good contact, with negligible hysteresis and exceptionally low normalized subthreshold swings.
    Type of Medium: Online Resource
    ISSN: 0003-6951 , 1077-3118
    RVK:
    Language: English
    Publisher: AIP Publishing
    Publication Date: 2006
    detail.hit.zdb_id: 211245-0
    detail.hit.zdb_id: 1469436-0
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  • 3
    In: Applied Physics Letters, AIP Publishing, Vol. 88, No. 7 ( 2006-02-13)
    Abstract: Plasma-free defect passivation is achieved on polycrystalline silicon thin-film transistors fabricated below 150°C by annealing and extracting H from SiNx:H interlayer dielectric. By annealing at 250°C without a plasma application, VT and μFE were improved from 11.5Vto3.5V and from 86cm2∕Vsto212cm2∕Vs, respectively. Improvement in performance is attributed to defect passivation by H diffusing out from SiNx:H. Dangling bonds and strained bonds can be acceptably passivated around 170°C, and 205°C, respectively. The activation energy for the diffusion of H into polycrystalline silicon was estimated to be 0.87eV.
    Type of Medium: Online Resource
    ISSN: 0003-6951 , 1077-3118
    RVK:
    Language: English
    Publisher: AIP Publishing
    Publication Date: 2006
    detail.hit.zdb_id: 211245-0
    detail.hit.zdb_id: 1469436-0
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  • 4
    Online Resource
    Online Resource
    AIP Publishing ; 2011
    In:  Physics of Plasmas Vol. 18, No. 7 ( 2011-07-01)
    In: Physics of Plasmas, AIP Publishing, Vol. 18, No. 7 ( 2011-07-01)
    Abstract: Spatial distributions of plasma densities and plasma potentials were measured by the Langmuir probe in the plasma which has eight side sources driven by 400 kHz main power. At low pressure, the energy flux to the chamber from the remote plasma was controlled by 13.56 MHz auxiliary power applied around the center due to the variation of the potential distribution. The energy flux from the side sources toward the chamber led to the synergistic effect on the increase in the center density. The drastic increase in the center density and the decrease in the edge density resulted in the efficient power dissipation for ionization.
    Type of Medium: Online Resource
    ISSN: 1070-664X , 1089-7674
    Language: English
    Publisher: AIP Publishing
    Publication Date: 2011
    detail.hit.zdb_id: 1472746-8
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  • 5
    Online Resource
    Online Resource
    AIP Publishing ; 1997
    In:  Journal of Applied Physics Vol. 81, No. 9 ( 1997-05-01), p. 6322-6327
    In: Journal of Applied Physics, AIP Publishing, Vol. 81, No. 9 ( 1997-05-01), p. 6322-6327
    Abstract: Polycrystalline BaTiO3 thin films with thickness ranging from 2100 to 20 000 Å were prepared on platinum substrates using off-axis radio-frequency magnetron sputtering. The variation in room temperature permittivity of the films was investigated with respect to thickness using x-ray diffraction and transmission electron microscopy. All films were ferroelectric and their room temperature permittivity, which was significantly higher than previously reported values, showed a strong dependence on film thickness. Higher permittivity was attributed primarily to the presence of ferroelectric domains. The room temperature permittivity of the thin films showed large variations with grain size, as in the case of BaTiO3 ceramics. The increase in permittivity with increasing film thickness was attributed to the decrease in defect concentration with grain growth. The 20 000 Å film showed an abrupt decrease in permittivity and the presence of an intergranular phase having titanium-excess composition; these phenomena are discussed in terms of domain boundary pinning and recrystallization.
    Type of Medium: Online Resource
    ISSN: 0021-8979 , 1089-7550
    Language: English
    Publisher: AIP Publishing
    Publication Date: 1997
    detail.hit.zdb_id: 220641-9
    detail.hit.zdb_id: 3112-4
    detail.hit.zdb_id: 1476463-5
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  • 6
    Online Resource
    Online Resource
    AIP Publishing ; 2010
    In:  Physics of Plasmas Vol. 17, No. 6 ( 2010-06-01)
    In: Physics of Plasmas, AIP Publishing, Vol. 17, No. 6 ( 2010-06-01)
    Abstract: For novel plasma diagnostics, the rf floating probe was revisited. For inducing the self-bias effect, ac bias voltage (∼kilohertz) was applied through a dc blocking capacitor between a probe and a signal generator. The dc self-bias potential was changed not only with ac bias voltages but also with electron temperatures, and therefore, the electron temperature was derived from the variations in the self-bias potential with and without ac bias voltage. The harmonic component of the probe contains information about the ion flux, and using a fast Fourier transform analysis of the probe current, the ion density was derived from the first harmonic current of the probe. The experimental results were compared with a single Langmuir probe. The electron temperature and the ion density were in good agreement with those from the Langmuir probe. Because the amplitude of the ac bias voltage is very low ( & lt;3 V), local ionizations affected by a high bias-voltage can be neglected.
    Type of Medium: Online Resource
    ISSN: 1070-664X , 1089-7674
    Language: English
    Publisher: AIP Publishing
    Publication Date: 2010
    detail.hit.zdb_id: 1472746-8
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  • 7
    Online Resource
    Online Resource
    AIP Publishing ; 2010
    In:  Physics of Plasmas Vol. 17, No. 6 ( 2010-06-01)
    In: Physics of Plasmas, AIP Publishing, Vol. 17, No. 6 ( 2010-06-01)
    Abstract: An improved ac superimposed method for measuring the electron energy distribution function (EEDF) with high accuracy is proposed. Although high amplitude of the superimposed ac voltage provides a higher signal-to-noise ratio (SNR), it causes the distortion in the EEDF. To correct the distortion, we used two different EEDFs measured by applying two different amplitudes. The distortion was accurately corrected over the entire electron energy region, and the corrected EEDF had the better SNR. The reliability of the corrected EEDF was proved by comparing the effective electron temperatures obtained from the measured EEDFs, and as a result, the corrected EEDF was very reliable.
    Type of Medium: Online Resource
    ISSN: 1070-664X , 1089-7674
    Language: English
    Publisher: AIP Publishing
    Publication Date: 2010
    detail.hit.zdb_id: 1472746-8
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  • 8
    In: Journal of Applied Physics, AIP Publishing, Vol. 96, No. 3 ( 2004-08-01), p. 1435-1442
    Abstract: The effect of fluorine incorporation on properties of silicon dioxide thin films has been studied as a function of NF3∕O2 gas flow ratio. Fluorine was incorporated into silicon dioxide films during high density plasma chemical vapor deposition with the SiH4∕O2∕NF3∕He gas mixture used to improve the gap-filling ability for shallow trench isolation of devices. Refractive index measured by ellipsometry decreased with increasing NF3∕O2 flow ratios for both as-deposited and annealed films. X-ray reflectivity measurements showed that both fluorine incorporation and thermal annealing reduced the film density. The analysis of infrared absorption spectra showed the relaxation of the Si-O-Si bond with increasing NF3∕O2 flow ratios and thermal annealing. The secondary ion mass spectroscopy and x-ray photoelectron spectroscopy studies confirmed the behavior of fluorine diffusion and the binding energy for each species in the films, respectively. These results showed that through fluorine incorporation and thermal annealing, the network structures of silicon dioxide could be modified from low order rings to high order rings accompanied by the enlargement of nanovoids.
    Type of Medium: Online Resource
    ISSN: 0021-8979 , 1089-7550
    Language: English
    Publisher: AIP Publishing
    Publication Date: 2004
    detail.hit.zdb_id: 220641-9
    detail.hit.zdb_id: 3112-4
    detail.hit.zdb_id: 1476463-5
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  • 9
    In: Physics of Plasmas, AIP Publishing, Vol. 18, No. 3 ( 2011-03-01)
    Abstract: The characteristics of probe currents induced by applying various probe voltage waveforms, such as sinusoidal, sawtooth, square, and triangular, were investigated at a floating potential. It was found that the measured probe currents have many harmonics depending on the voltage waveforms. This was mainly due to the nonlinearity of the sheath in the plasma and was analyzed using the fast Fourier transform and a circuit model. By applying a triangular voltage waveform to a probe, plasma parameters such as electron temperature and plasma density could be obtained and compared to those of a single Langmuir probe and a floating harmonic method.
    Type of Medium: Online Resource
    ISSN: 1070-664X , 1089-7674
    Language: English
    Publisher: AIP Publishing
    Publication Date: 2011
    detail.hit.zdb_id: 1472746-8
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  • 10
    Online Resource
    Online Resource
    AIP Publishing ; 2015
    In:  Review of Scientific Instruments Vol. 86, No. 12 ( 2015-12-01)
    In: Review of Scientific Instruments, AIP Publishing, Vol. 86, No. 12 ( 2015-12-01)
    Abstract: An in-situ real-time processing chamber wall monitoring system was developed. In order to measure the thickness of the dielectric film, two frequencies of small sinusoidal voltage (∼1 V) signals were applied to an electrically floated planar type probe, which is positioned at chamber wall surface, and the amplitudes of the currents and the phase differences between the voltage and current were measured. By using an equivalent sheath circuit model including a sheath capacitance, the dielectric thickness can be obtained. Experiments were performed in various plasma condition, and reliable dielectric film thickness was obtained regardless of the plasma properties. In addition, availability in commercial chamber for plasma enhanced chemical vapor deposition was verified. This study is expected to contribute to the control of etching and deposition processes and optimization of periodic maintenance in semiconductor manufacturing process.
    Type of Medium: Online Resource
    ISSN: 0034-6748 , 1089-7623
    Language: English
    Publisher: AIP Publishing
    Publication Date: 2015
    detail.hit.zdb_id: 209865-9
    detail.hit.zdb_id: 1472905-2
    SSG: 11
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