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  • 1
    Keywords: Gaseous dielectrics -- Congresses. ; Electronic books.
    Type of Medium: Online Resource
    Pages: 1 online resource (702 pages)
    Edition: 1st ed.
    ISBN: 9781483191072
    Language: English
    Note: Front Cover -- Gaseous Dielectrics V -- Copyright Page -- Table of Contents -- PREFACE -- CHAPTER 1: BASIC PHYSICS OF GASEOUS DIELECTRICS -- Excitation and Ionization Coefficients -- Discussion -- Laser-Enhanced Electron Attachment and Its Possible Application for Optical Switching -- Discussion -- Galvanooptical Measurement of Photodetachment from Negative Ion Swarms in Oxygen -- Discussion -- Electron Collision Cross Sections for C F and N 0 -- Discussion -- A Macroscopic Model of Electron Swarm Motion in Non-equilibrium Regions -- Non-Equilibrium Description of Electrons in a Gas Influenced by Space-Time Varying Electric Fields -- Temperature Dependent Electron Transport and Rate Coefficient Studies for e-Beam-Sustained Diffuse Gas Discharge Switching -- Time Dependent Conductivity Studies of Electron Thermalisation in Simple Gases -- CHAPTER 2. BASIC MECHANISMS -- Breakdown Mechanisms in Electronegative Gases -- Discussion -- Predischarge Development in N2 and SF6 at High Gas Pressures -- Discussion -- Effect of Temperature on the Uniform Field Breakdown Strength of Electronegative Gases -- Discussion -- The Influence of Thermal Ionization on Electrical Breakdown -- Discussion -- Contribution to a Unified Theory of the Leader Processes -- Discussion -- The Influence of Thermal Ionization on Electrical Breakdown -- Discussion -- Contribution to a Unified Theory of the Leader Processes -- Discussion -- Mechanism of a Short Gap Breakdown -- Experimental Investigation of the Streamer to Leader Transition in SF6 Under Negative Polarity -- Modeling of Leader Branching in Electronegative Gases -- The Leader Inception Characteristics in Positive Sphere-Plane Air Gaps -- Velocity Measurements in Mixtures of SF6 and N2 in Non-Uniform Field Gaps Under Positive Impulse Voltage -- CHAPTER 3: GAS DECOMPOSITION/REACTIONS/TOXICITY. , Decomposition of SF6 by Arc Discharge and the Determination of the Reaction Product S2 F10 -- Discussion -- Corona-Induced Decomposition of Dielectric Gases -- Discussion -- Investigations of the Toxicological Action of Spark- Decomposed SF6 in Mammalian Cells -- Discussion -- Degradation of the Dielectric Properties of SF6 Due to the Presence of Gaseous Impurities -- Deviations to the "Paschen's Law" at High Pressures for Positive Polarity -- Discussion -- The Influence of Impurities on the Dielectric Strength of SF6 for Positive Polarity -- The Nature of Initiatory Electrons -- Formation and Stability of SF6 and S2 F10 -- SOF4 Production in Spark Breakdown of SF6/O2 Mixtures -- Assay of SF6 and Spark-Decomposed SF6 for Mutagenic Activity in the CHO/HGPRT Mammalian Cell System -- CHAPTER 4: DIAGNOSTICS/FIELD PROBES -- Gas Analysis as a Diagnostic Tool for Gas-Insulated Equipment -- Discussion -- On the Possibility of Diagnostics of GCB and GIS by Gas Chromatography -- Discussion -- On the Electrostatics of Probe Measurements of Surface Charge Densities -- Discussion -- Measurement of Accumulated Charge on Dielectric Surfaces with an Electrostatic Probe -- Discussion -- The Effect of Humidity on Space Charge Growth in Short Air Gaps -- Laser Probing of Air Gaps Under AC Conditions -- CHAPTER 5. GASES/MIXTURES FOR GIS TRANSFORMERS AND CIRCUIT BREAKERS -- Predicting the Breakdown Strength of Mixtures from Basic Data -- Discussion -- The Dielectric Strength of Dichlorotetrafluoroethane (1,2-C2 CI2 F4) Determined in a Combined Swarm/Breakdown Study -- Discussion -- The Influence of Gaseous Admixtures to SF6 on the Corona Stabilized Regime at AC and at Positive Impulse Voltage -- Discussion -- Nonuniform Field Corona and Breakdown Characteristics of SF6/Freon Mixtures -- Discussion. , Effect of a Trichlorotrifluoroethane Vapor Additive on Dielectric Strength of SF6 Gas -- Measurement of the Figure of Merit M for Several Perfluorocarbon Gases -- Breakdown Voltage Measurement of Some Vapor-Mist Dielectrics -- CHAPTER 6: GASEOUS MEDIA FOR DISCHARGE CHEMISTRY AND ETCHING/CORON -- Gaseous Media for Plasma Chemistry and Etching -- Discussion -- Practical Implications of Dry Plasma Processing -- Discussion -- Important Considerations for Optimizing Production Rates in RF Discharge Chemistry -- Discussion -- Negative DC Corona Discharge in SF6 for Highly Divergent Fields -- Discussion -- Calculation of Corona Onset Voltage with Space Charge Effect -- DC Corona Control in Coaxial Gas Insulating Systems -- CHAPTER 7. GAS ENGINEERING FOR PULSED POWER AND SWITCHING -- Gas Engineering for Pulsed Power and Switching -- Discussion -- Penning Ionization Ternary Gas Mixtures for Diffuse Discharge Opening Switches -- Discussion -- Gas Mixtures for Spark Gap Closing Switches with Emphasis on Efficiency of Operation -- Discussion -- The Influence of Transverse Magnetic Fields on Glow Discharges in He/SF6 Gas Mixtures -- Discussion -- Analysis of the Cathode Fall of Glow Discharges in a He/SF6 Gas Mixture -- Gas Engineering Studies for High Pressure Self-Sustained Diffuse Discharge Closing Switches -- Diffuse Discharges in High-Pressure Mixtures of c-C4 F8 and He -- CHAPTER 8. GAS BREAKDOWN UNDER STEEP-FRONTED VOLTAGES -- Statistical Breakdown Process in SF6 and Breakdown Voltage Calculations -- Discussion -- Formative Time Lags in SF6 N2 Mixtures for Different Field Distribution -- Discussion -- Voltage-Time Characteristics of Impulse Breakdown in SF6 Gas -- Discussion -- Spacer Flashover Time Lags in SF6 Under Fast-Front Impulse Voltages -- Discussion -- Breakdown Voltage-Time Characteristics in SF6 Mixtures for a Coaxial Cylinder Gap. , Effect of Field Divergence on the Lightning Impulse Breakdown of Rod-Plane Gaps in N2/SF6 Mixtures -- Free Particle Initiated Breakdown of SF6 Under Voltages of Different Time Dependence -- CHAPTER 9. NEW DEVELOPMENTS IN GAS-INSULATED EQUIPMENT/GAS HANDLING -- Development of ±500 kV HVDC Gas-Insulated Switchgears -- Discussion -- A Manufacturer's Experience in the Cyclic Use of SF6 Gas -- Discussion -- Volt-Time Curves of Disconnector-Generated Fast Transients inside GIS -- Discussion -- Insulation Characteristics of Separate Cooling Sheet Winding-Type Gas-Insulated Transformer -- Discussion -- Recovery Strength of SF6-Insulated Gaps Stressed by Double Lighting Impulse Voltages -- Conduction Currents in Gas-Insulated Switchgear for Low Level DC Stress -- Effects of Electrode Surface Roughness on Dark Current and Switching Impulse Breakdown Voltage in Compressed SF6 Gas -- Mixing Rates and Diffusion of Various Gases and Moisture into SF6 -- CHAPTER 10. GAS/INSULATOR INTERFACE/FLASHOVER -- Surface Changes Induced by Low Kinetic Energy Products from Corona Discharge on Epoxy Resin in Air -- Discussion -- Avalanches Near a Dielectric Spacer in Nitrogen Gas -- Discussion -- Measurement of the Temporal Decay of Charges on Insulator Surfaces -- Discussion -- Effect of Ribs on Surface Discharge in SF6 Gas -- Discussion -- Application of ESCA in GIS Spacer Surface Analysis -- Discussion -- Study of the Charge Build-up on Dielectrics Submitted to Corona Discharge and Ageing Effects -- Influence of 60 Hz AC Charging of Spacers on Subsequent Impulse Flashover in Compressed SF6 -- Surface Flashover of Polyester, Polypropylene, and Teflon Films in Low Pressure SF6 and N2 Media -- Research on Conductor-Plane Long-Gap Characteristics by Surface Discharge Analogy Model. , The Surface and Volume Effects of Interactions of Internal Partial Discharges with Solid Dielectrics -- CHAPTER 11. QUALITY CONTROL IN TESTING GAS-INSULATED APPARATUS -- Fundamental Knowledge and the Testing of GIS -- Discussion -- Flashover Damage Test Procedure for Insulating Materials in Compressed SF6 -- Discussion -- Strength of Typical GIS Configurations with Special Reference to Composite and Combined Stresses -- Discussion -- Limits to Partial Discharge Detection -- Discussion -- Broad Band Pulse Detection Studies of Corona and Breakdown in Air, N2, O2, CO2 AND SF6 and SF6 -N2 Mixtures -- CHAPTER 12: REPORTS OF DISCUSSION GROUPS -- Group Discussion on New Diagnostic Techniques -- Group Discussion on Gas-Insulated Transformers and DC GIS -- Group Discussion on Gas Engineering for Modern Technologies: Input from Basic Data -- LIST OF PARTICIPANTS -- PHOTOGRAPHS OF PARTICIPANTS -- AUTHOR INDEX.
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  • 2
    Electronic Resource
    Electronic Resource
    College Park, Md. : American Institute of Physics (AIP)
    The Journal of Chemical Physics 90 (1989), S. 6275-6289 
    ISSN: 1089-7690
    Source: AIP Digital Archive
    Topics: Physics , Chemistry and Pharmacology
    Notes: Enhanced electron attachment to KrF excimer laser irradiated thiophenol (C6H5SH) molecules has been studied in a electron swarm experiment using nitrogen as the buffer gas. Two distinct electron attachment processes were found to be responsible for the observed large enhancement in electron attachment under different experimental conditions. One enhanced electron attachment process occurred immediately (within a few μs) after laser irradiation and is shown to be due to dissociative electron attachment to electronically excited thiophenol molecules in their first excited triplet state produced indirectly via excited singlet states reached by excimer laser irradiation. At low mean electron energies (∼0.1 eV), up to 5 orders of magnitude enhancement in electron attachment has been observed for the triplet state compared to the ground electronic state. This enhanced electron attachment decreased with (i) increasing nitrogen pressure due to quenching of the first excited singlet state of thiophenol (precursor of the triplet state) by nitrogen, and (ii) increasing time delay between laser irradiation and subsequent electron attachment to the laser-irradiated molecules. This latter observation is shown to be due to the self-(triplet–triplet) quenching of the electron attaching triplet state molecules. The second observed enhanced electron attachment process occurred at longer times (〉100 μs) after laser irradiation and is attributed to the electron attachment to diphenyl disulfide (C6H5SSC6H5) produced by the interaction of thiophenoxy radicals (C6H5S (overdot)) formed directly or indirectly via laser irradiation.
    Type of Medium: Electronic Resource
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