In:
Applied Physics Letters, AIP Publishing, Vol. 55, No. 16 ( 1989-10-16), p. 1644-1646
Abstract:
Photochemical vapor deposition of carbon films from n-butane gas has been successfully done, for the first time, at room temperature using synchrotron radiation as a light source. The deposited films are hydrogenated amorphous carbon films with sp3 bonds. The deposition rate increases with negative bias.
Type of Medium:
Online Resource
ISSN:
0003-6951
,
1077-3118
Language:
English
Publisher:
AIP Publishing
Publication Date:
1989
detail.hit.zdb_id:
211245-0
detail.hit.zdb_id:
1469436-0
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