GLORIA

GEOMAR Library Ocean Research Information Access

feed icon rss

Your email was sent successfully. Check your inbox.

An error occurred while sending the email. Please try again.

Proceed reservation?

Export
Filter
  • 1990-1994  (19)
Document type
Years
Year
  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 71 (1992), S. 1802-1806 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have measured the emission energy, Ee, and the capture energy, Ec, and derived the thermal activation energy of the DX center, EDX, in n-Al0.32Ga0.68As as a function of uniaxial stresses along the 〈100〉 and the 〈111〉 directions. We found that the stress coefficients of EDX change sign when the band gap of Al0.32Ga0.68As changes from direct to indirect for both stress directions, and the stress coefficients of EDX in the indirect region are about same for both stress directions. These results agree with the model proposed by Chadi and Chang which assumes that the DX center is a highly localized center and disagree with the model which takes the DX center to be the effective-mass state associated with the L minima.
    Type of Medium: Electronic Resource
    Location Call Number Limitation Availability
    BibTip Others were also interested in ...
  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 70 (1991), S. 2173-2184 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We present experimental results of Al/n- and Al/p-type GaAs Schottky barrier structures grown in situ by molecular-beam epitaxy with thin Si epitaxial interfacial layers. The barrier heights are measured by the I-V, thermal activation, C-V, and photoresponse methods. Barrier heights in the range of 0.3〈φbN〈1.04 eV for n-type GaAs and 0.28 〈 φbP〈1.01 eV for p-type GaAs were obtained for Si layer thicknesses between 6 and 100 A(ring). Annealing studies conducted on the samples indicate that the structures are thermally stable to temperatures up to 450 °C. These results imply that the GaAs surface Fermi level at the Si/GaAs interface is unpinned from its customary near-midgap value. A model which involves the energy-band discontinuities ΔEC and ΔEV between GaAs and Si, the thickness, and the doping of the Si layer is suggested to account for the different barrier-height values obtained.
    Type of Medium: Electronic Resource
    Location Call Number Limitation Availability
    BibTip Others were also interested in ...
  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 69 (1991), S. 8241-8246 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have measured the current-voltage characteristics of GaAs-AlAs-GaAs-AlAs-GaAs double-barrier heterostructures grown by molecular beam epitaxy on (100) oriented substrates under longitudinal uniaxial stress along 〈100〉 (parallel to current) direction and transverse uniaxial stress along 〈011〉 (perpendicular to current) direction at 77 K. For longitudinal stress measurement, the peak-to-valley current ratio due to Γ conduction electrons and the peak voltage (the voltage where the current peaks) decrease essentially with longitudinal stress and the negative differential resistance (NDR) disappears at a stress that depends on the dopings and dimensions of the heterostructures. However, it is surprisingly recovered at very high stress and the peak voltage reappears at a lower voltage, which is quite in contrast with the previous report for hydrostatic pressure studies. The observed shifts of the peak voltage, the decrease of the peak current, and hence the disappearance of the NDR are consistent with pressure-induced increase of the effective mass. The recovery of Γ-NDR is explained by the more rapid reduction of Xl (momentum conserving longitudinal X valleys) nonresonant current due to the increase of reflections at GaAs/AlAs interfaces under very high uniaxial stress, where there are potential wells rather than barriers for Xl current. A distinct NDR near- zero bias (∼40 mV) appears when the externally applied uniaxial stress is high enough. This has been attributed by Mendez and Chang [Surf. Sci. 229, 173 (1990)] to the resonant tunneling between two-dimensional electron gases. Our experiment shows that this tunneling is via momentum conserving longitudinal X-valleys (Xl). For transverse stress measurement, there is no evidence of this feature up to 7 kbar.
    Type of Medium: Electronic Resource
    Location Call Number Limitation Availability
    BibTip Others were also interested in ...
  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 69 (1991), S. 525-527 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Longitudinal uniaxial stress along 〈100〉 has been applied in AlAs-GaAs-AlAs resonant tunneling heterostructures grown on (100) substrates to study the current-voltage characteristics as a function of stress. We find that the nonresonant current is due to Fowler–Nordheim tunneling currents by both longitudinal and transverse X valleys (X1 and Xt). This current decreases with low stress (〈1 kbar), increases with intermediate stress and decreases with high stress (〉9 kbar) again. This is due to the increase of the Xt barrier at low stress, the decrease of the X1 barrier at intermediate stress, and the formation and the increase of X1 potential well depth at high stress. We also find a large unexplained monotonic decrease of the resonant current through the Γ valley.
    Type of Medium: Electronic Resource
    Location Call Number Limitation Availability
    BibTip Others were also interested in ...
  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 71 (1992), S. 4632-4634 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A standard Ga0.51In0.49P/GaAs modulation-doped field-effect transistor (MODFET) structure and a novel Ga0.51In0.49P/GaAs MODFET structure where the Ga0.51In0.49P spacer layer was replaced by an undoped Al0.3Ga0.7As layer were grown using a gas source molecular beam epitaxy. The Hall mobility of the novel MODFET's structures are 6600 and 36 400 cm2/V s at room temperature and 77 K, respectively, which are more than twice as high as that in the ordinary Ga0.51In0.49P/GaAs MODFETs structure. The mobility is attributed to better carrier confinement and smoother heterointerface. Furthermore, it is found that both ordinary and novel MODFET's structures have small photo-persistant conductivity effects at low temperatures and that the FETs made in these materials had no threshold voltage shift at low temperatures after illumination.
    Type of Medium: Electronic Resource
    Location Call Number Limitation Availability
    BibTip Others were also interested in ...
  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 76 (1994), S. 7931-7934 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Al/n:GaInP and Al/p:GaInP Schottky diodes have been grown by molecular-beam epitaxy with and without thin (6 A(ring)) interfacial Si layers. The Schottky barrier heights were measured by C-V, I-V, and I-V-T techniques. The n- and p-type barrier heights for the samples without interfacial Si were 0.86 and 0.93 eV, respectively. Interfacial Si enhanced the n-type barrier by 0.17 eV, and reduced the p-type barrier by 0.08 eV. The sum of the n- and p-type barrier heights for the samples with the Si layer was equal to the band gap of GaInP; without Si the sum was less. By comparing this data to the Al/Si/GaAs data, GaAs-GaInP conduction- and valence-band discontinuities of 0.05 and −0.41 eV, respectively, have been inferred. © 1994 American Institute of Physics.
    Type of Medium: Electronic Resource
    Location Call Number Limitation Availability
    BibTip Others were also interested in ...
  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 76 (1994), S. 371-375 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Al/Si/n:GaAs Schottky diode structures have been grown by molecular-beam epitaxy utilizing thin (100 A(ring)) Si interfacial layers. These Si layers are unintentionally very heavily n-type doped with As from the system or from the substrate. This n-type doping is intentionally compensated with p-type (Al) doping during the growth of the Si layer in an attempt to modulate the Schottky barrier height. The resultant barrier height, as determined by I-V and C-V measurements, increases with increased acceptor doping in the Si (from 0.34 eV for no Al doping to a maximum of 1.07 eV) as per Poisson's equation.
    Type of Medium: Electronic Resource
    Location Call Number Limitation Availability
    BibTip Others were also interested in ...
  • 8
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 58 (1991), S. 2366-2368 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have used the deep level transient spectroscopy signal height as a function of applied stress data and the statistics of the occupancy of the DX center to obtain the stress dependence of the thermal binding energy of the neutral DX center, EDX. We find that EDX decreases with about the same rate for uniaxial stresses along 〈100〉 and 〈111〉 directions. Our results confirm that the DX center is a highly localized center as proposed by Chadi and Chang and disagree with the model assuming the DX center being an effective mass state of the doping impurity associated with the L band.
    Type of Medium: Electronic Resource
    Location Call Number Limitation Availability
    BibTip Others were also interested in ...
  • 9
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 59 (1991), S. 1191-1193 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A novel manifestation of piezoelectric effects in GaAs has been observed. The change of barrier height, φB, of Schottky diodes induced by uniaxial stresses, S, along 〈100〉, 〈011〉, 〈01¯1〉, and 〈111〉 has been measured. Shifts in φB due to the appearance of piezoelectric polarization charges at the semiconductor-metal interface for directions other than 〈100〉 are observed.
    Type of Medium: Electronic Resource
    Location Call Number Limitation Availability
    BibTip Others were also interested in ...
  • 10
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 58 (1991), S. 382-384 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Al/n-GaAs and Al/Si/n-GaAs structures with thin silicon interfacial layers were grown in situ by molecular beam epitaxy and their electrical characteristics were measured. Effective barrier heights between 0.30 and 1.04 eV were determined through I-V and C-V measurements in the Al/Si/n-GaAs structures under varying conditions of deposition of the silicon layer, in contrast to a barrier height of 0.78 eV without the silicon layer. The conduction-band offset between Si and GaAs is estimated to be of the order of 0.3±0.05 eV. The results indicate that the Fermi level at the interface of GaAs on Si in the Al/Si/n-GaAs structure is unpinned from its midgap value.
    Type of Medium: Electronic Resource
    Location Call Number Limitation Availability
    BibTip Others were also interested in ...
Close ⊗
This website uses cookies and the analysis tool Matomo. More information can be found here...