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  • 1
    Online Resource
    Online Resource
    American Chemical Society (ACS) ; 1990
    In:  Analytical Chemistry Vol. 62, No. 24 ( 1990-12-15), p. 1245A-1254A
    In: Analytical Chemistry, American Chemical Society (ACS), Vol. 62, No. 24 ( 1990-12-15), p. 1245A-1254A
    Type of Medium: Online Resource
    ISSN: 0003-2700 , 1520-6882
    Language: English
    Publisher: American Chemical Society (ACS)
    Publication Date: 1990
    detail.hit.zdb_id: 1483443-1
    detail.hit.zdb_id: 1508-8
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  • 2
    Online Resource
    Online Resource
    American Chemical Society (ACS) ; 1990
    In:  Analytical Chemistry Vol. 62, No. 22 ( 1990-11-15), p. 1159A-1166A
    In: Analytical Chemistry, American Chemical Society (ACS), Vol. 62, No. 22 ( 1990-11-15), p. 1159A-1166A
    Type of Medium: Online Resource
    ISSN: 0003-2700 , 1520-6882
    Language: English
    Publisher: American Chemical Society (ACS)
    Publication Date: 1990
    detail.hit.zdb_id: 1483443-1
    detail.hit.zdb_id: 1508-8
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  • 3
    Online Resource
    Online Resource
    Cambridge University Press (CUP) ; 1990
    In:  Proceedings, annual meeting, Electron Microscopy Society of America Vol. 48, No. 2 ( 1990-08-12), p. 210-211
    In: Proceedings, annual meeting, Electron Microscopy Society of America, Cambridge University Press (CUP), Vol. 48, No. 2 ( 1990-08-12), p. 210-211
    Abstract: The electron beam energy is a parameter required for quantitative electron probe microanalysis. In fact, it occurs in all parts of the ZAF type matrix correction procedure as well as in all of the other matrix correction procedures. Recently, there has been much interest in analyzing materials using lower beam voltages. Since the correction procedures use the so called “overvoltage” term (beam energy/excitation energy), uncertainties in the beam voltage will generate larger errors than when high beam voltages are used. The user may well be faced with an instrument that does not have a very precise voltmeter to measure the beam voltage, or the reported voltage may not actually represent the potential drop from the filament to ground (specimen). The true beam energy may differ from the “measured” potential drop by several hundred volts. It is difficult and potentially exciting to measure the beam voltage with a calibrated voltmeter; however, we have a built-in method available in the energy-dispersive x-ray detector.
    Type of Medium: Online Resource
    ISSN: 0424-8201 , 2690-1315
    Language: English
    Publisher: Cambridge University Press (CUP)
    Publication Date: 1990
    SSG: 11
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  • 4
    Online Resource
    Online Resource
    Cambridge University Press (CUP) ; 1994
    In:  Proceedings, annual meeting, Electron Microscopy Society of America Vol. 52 ( 1994), p. 384-385
    In: Proceedings, annual meeting, Electron Microscopy Society of America, Cambridge University Press (CUP), Vol. 52 ( 1994), p. 384-385
    Abstract: Rigorous electron probe x-ray microanalysis (EPMA) with energy dispersive x-ray spectrometry (EDS) takes place in two sequential steps: qualitative analysis followed by quantitative analysis. Qualitative analysis: Qualitative analysis involves the assignment of the peaks found in the x-ray spectrum to specific elements. One of the most important attributes of energy dispersive x-ray spectrometry (EDS) for qualitative analysis is that we can always view the complete x-ray spectrum. The EDS photon detection process effectively provides parallel detection in energy. Depending on the detector window and spectrometer characteristics, the entire energy range from Be K radiation (0.106 keV) to the incident beam energy can be available for analysis. With an incident beam energy of 15 keV, at least one family of x-ray lines (K, L, or M shell) will be excited for each element in the Periodic Table with atomic number ≥ 4. We ignore at our peril this capability to do a complete qualitative analysis at all specimen locations that we choose to measure. Quantitative analysis is meaningless if qualitative analysis has not been properly perfonned first. The bases for qualitative analysis include the exact energy of the peak(s), which places a premium on spectrometer calibration, the recognition of all members of each x-ray family and the possibility of two (or more) families being excited, the relative intensities ("weights of lines") within a family, and the artifacts associated with each high intensity peak, particularly the escape peak(s) and sum peak(s).
    Type of Medium: Online Resource
    ISSN: 0424-8201 , 2690-1315
    Language: English
    Publisher: Cambridge University Press (CUP)
    Publication Date: 1994
    SSG: 11
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  • 5
    Online Resource
    Online Resource
    Cambridge University Press (CUP) ; 1990
    In:  Proceedings, annual meeting, Electron Microscopy Society of America Vol. 48, No. 2 ( 1990-08-12), p. 198-199
    In: Proceedings, annual meeting, Electron Microscopy Society of America, Cambridge University Press (CUP), Vol. 48, No. 2 ( 1990-08-12), p. 198-199
    Abstract: The characteristic fluorescence correction is used in electron probe microanalysis to account for the x-ray intensity excited in element “a” by the x-rays from the characteristic line of another element, “b”, in the sample. Since the excited intensity is not generated by the primary electron beam, it is necessary to apply the fluorescence correction for quantitative elemental analysis. This correction can be significant particularly when element “b” is a major component of the sample and the characteristic line for element “b” is slightly higher in energy than the critical excitation energy for the excited line of element “a”. The fluorescence correction, which is used in the various analytical programs, is described in equation 1. where I'* fa /I'* pa is the ratio of the emitted “a” intensity excited by “b” x-rays to the emitted intensity excited by the primary electron beam. The various parameters in this equation are accurately known for the K x-ray lines, but only very limited information is available for the M x-ray lines.
    Type of Medium: Online Resource
    ISSN: 0424-8201 , 2690-1315
    Language: English
    Publisher: Cambridge University Press (CUP)
    Publication Date: 1990
    SSG: 11
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  • 6
    In: Scanning, Wiley, Vol. 15, No. 3 ( 1993), p. 174-174
    Type of Medium: Online Resource
    ISSN: 0161-0457
    Language: English
    Publisher: Wiley
    Publication Date: 1993
    detail.hit.zdb_id: 1497198-7
    SSG: 11
    SSG: 12
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  • 7
    Online Resource
    Online Resource
    Cambridge University Press (CUP) ; 1993
    In:  Proceedings, annual meeting, Electron Microscopy Society of America Vol. 51 ( 1993-08-01), p. 502-503
    In: Proceedings, annual meeting, Electron Microscopy Society of America, Cambridge University Press (CUP), Vol. 51 ( 1993-08-01), p. 502-503
    Abstract: Electron beam x-ray microanalysis with energy dispersive x-ray spectrometry (EDS), as performed in electron probe microanalyzers (EPMA)/scanning electron microscopes (SEM) for thick specimens and analytical electron microscopes (AEM) for thin sections, is a powerful technique with wide applicability in the physical and biological sciences and technology communities. The operation of an EDS x-ray microanalysis system has been automated to the point that many users now consider EDS to be a routine tool where the results reported by the automation system are always correct Unfortunately, there are numerous pitfalls awaiting the unwary analyst. All EDS users require a basic level of literacy in x-ray microanalysis to properly interpret spectra and develop a sensible analysis strategy for their problems. This “basic literacy” includes knowledge of the factors controlling the efficiency of production of characteristic and continuum x-rays, the characteristic energies and structure of x-ray families that provide the basis for qualitative analysis, the operational characteristics of energy dispersive x-ray spectrometers, including artifacts, and the systematic procedures for qualitative and quantitative analysis.
    Type of Medium: Online Resource
    ISSN: 0424-8201 , 2690-1315
    Language: English
    Publisher: Cambridge University Press (CUP)
    Publication Date: 1993
    SSG: 11
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  • 8
    Online Resource
    Online Resource
    Cambridge University Press (CUP) ; 1990
    In:  Proceedings, annual meeting, Electron Microscopy Society of America Vol. 48, No. 2 ( 1990-08-12), p. 196-197
    In: Proceedings, annual meeting, Electron Microscopy Society of America, Cambridge University Press (CUP), Vol. 48, No. 2 ( 1990-08-12), p. 196-197
    Abstract: Monte Carlo electron trajectory simulation provides a powerful tool for theoretical studies of electron/x-ray interactions in solid targets. The great power of a Monte Carlo technique arises from the stepwise treatment of the electron trajectory in the target, which provides the capability of dealing with unusual geometric boundary conditions which differ from the ideal of a flat, polished, semiinfinite slab. Special targets, such as randomly tilted surfaces, particles, thin foils, and films supported on substrates, can be simulated by a Monte Carlo procedure. It is proper to speak of “a” rather than “the” Monte Carlo procedure because there is no single formulation of the simulation in universal use. A variety of choices exists for the treatment of the scattering and energy loss processes. In particular, the approach to simulating inelastic scattering varies widely. While most calculations consider inelastic scattering by means of a continuous energy loss approximation rather than by modeling the discrete inelastic processes, there are now several different choices proposed for the treatment of energy loss in the low energy range ( 〈 3 keV) where the Bethe model proves inadequate.
    Type of Medium: Online Resource
    ISSN: 0424-8201 , 2690-1315
    Language: English
    Publisher: Cambridge University Press (CUP)
    Publication Date: 1990
    SSG: 11
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  • 9
    Online Resource
    Online Resource
    Cambridge University Press (CUP) ; 1992
    In:  Proceedings, annual meeting, Electron Microscopy Society of America Vol. 50, No. 2 ( 1992-08), p. 1294-1295
    In: Proceedings, annual meeting, Electron Microscopy Society of America, Cambridge University Press (CUP), Vol. 50, No. 2 ( 1992-08), p. 1294-1295
    Abstract: Calculations of spatial resolution in scanning electron microscopy are typically based on estimates of the beam size from considerations of the electron optics. The gaussian beam diameter, d g , which is determined from the brightness equation, the contributions of the aberrations (spherical, d S and chromatic, d C ), and aperture diffraction (d D ) are added in quadrature to give the diameter of the focused probe, d p : (1) This formula can predict the size of the unscattered probe outside of the specimen but to predict image resolution, it is necessary to include a description of the beam interaction with the target. Monte Carlo electron trajectory simulation provides a good description of the complex, multiple scattering situation that exists and the distribution of signals emitted, but the simulation is too slow to be used for on-line calculations, except for a few laboratories with direct access to a parallel-processing computer environment. Monte Carlo studies show that the distribution of emitted signals is dominated by the scattering processes and not by the beam size, at least for high resolution conditions.
    Type of Medium: Online Resource
    ISSN: 0424-8201 , 2690-1315
    Language: English
    Publisher: Cambridge University Press (CUP)
    Publication Date: 1992
    SSG: 11
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  • 10
    Online Resource
    Online Resource
    Cambridge University Press (CUP) ; 1994
    In:  Proceedings, annual meeting, Electron Microscopy Society of America Vol. 52 ( 1994), p. 376-377
    In: Proceedings, annual meeting, Electron Microscopy Society of America, Cambridge University Press (CUP), Vol. 52 ( 1994), p. 376-377
    Abstract: Electron probe x-ray microanalysis (EPMA) with energy dispersive x-ray spectrometry (EDS) provides the capability for detecting elements with atomic number ≥ 4 (beryllium) from an excited specimen volume with linear dimensions of micrometers and a mass in the picogram range. To maximize the utility of EPMA/EDS, the analyst needs to understand the rich source of information that is potentially available in the x-ray spectrum. At its most basic level, interpretation of the spectrum consists of recognizing and identifying the various components of the spectrum as recorded by the EDS system: characteristic peaks, artifacts, and continuum background. While a modern EDS system is capable of making this interpretation in an automatic fashion, the careful analyst will always check the computer’s interpretation, which of course demands that the analyst be at least as "smart" as the computer! A systematic examination of spectra from pure elements or simple compounds is a good way to develop the necessary working knowledge.
    Type of Medium: Online Resource
    ISSN: 0424-8201 , 2690-1315
    Language: English
    Publisher: Cambridge University Press (CUP)
    Publication Date: 1994
    SSG: 11
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