In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 32, No. 8R ( 1993-08-01), p. 3420-
Abstract:
We investigated the hydride structures at the step edges on Si(111) surfaces after removing surface oxide with HF solution followed by immersion in boiling water, using polarized infrared attenuated total-reflection spectroscopy. Vicinal (111) surfaces misoriented toward the [112̄] direction at angles of 0°, 2°, and 4° were used to elucidate the hydride structures at the steps. We assigned absorption peaks to monohydride chains at the step edges along the [1̄10] direction, vertical dihydride (whose three atoms form a surface vertical to [111]) at the kinks, and monohydride on the terraces. We determined that the silicon monohydride chain forms an atomically straight step edge along the [1̄10] direction with a small amount of vertical dihydride kinks after 5-min immersion in boiling water. Based on these assignments, we reexamined the water temperature and time dependence of these hydride structures and discussed the step formation mechanism.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.32.3420
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
1993
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
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