In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 32, No. 4A ( 1993-04-01), p. L543-
Abstract:
Silylene radicals (SiH 2 ) in a 40-W 40-mTorr RF (13.56 MHz) SiH 4 /Ar plasma were detected by use of a laser-induced-fluorescence (LIF) technique. The observed SiH 2 density increased with increasing Ar partial pressure. The absolute SiH 2 density, estimated from the comparison of the LIF intensity with the intensity of Rayleigh scattering caused by N 2 molecules, is in the range of 10 9 -10 10 cm -3 .
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.32.L543
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
1993
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
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