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  • American Vacuum Society  (2)
  • 1990-1994  (2)
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  • American Vacuum Society  (2)
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Language
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  • 1990-1994  (2)
Year
Subjects(RVK)
  • 1
    Online Resource
    Online Resource
    Pyrometric interferometry for real time molecular beam epitaxy process monitoring
    American Vacuum Society ; 1994
    In:  Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena Vol. 12, No. 2 ( 1994-03-01), p. 1207-1210
    Details
    In: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, American Vacuum Society, Vol. 12, No. 2 ( 1994-03-01), p. 1207-1210
    Abstract: Pyrometric interferometry (PI) has recently been demonstrated for simultaneous real time wafer temperature and thickness measurement during the molecular beam epitaxy process. Both parameters of the thin film layer can be determined from the changing interference conditions in the layer. We used a reflection assisted version of PI to follow the thermal history of the wafer under different conditions and were able to resolve temperature to less than 1 °C. For thickness measurements, a parabolic fitting algorithm was used to accurately determine the endpoints of the GaAs/AlAs quarter wave stacks. Compared to other noncontact methods this technique can be used for very thick layers and is unaffected by the layer absorption and optical effects.  
    Type of Medium: Online Resource
    ISSN: 1071-1023 , 1520-8567
    URL: Article
    DOI: 10.1116/1.587045
    RVK:
    UA 4922
    Language: English
    Publisher: American Vacuum Society
    Publication Date: 1994
    detail.hit.zdb_id: 3117331-7
    detail.hit.zdb_id: 3117333-0
    detail.hit.zdb_id: 1475429-0
    Location Call Number Limitation Availability
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    Online Resource
  • 2
    Online Resource
    Online Resource
    Proposal to study the thermopower produced by a vacuum-tunneling junction
    American Vacuum Society ; 1994
    In:  Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena Vol. 12, No. 3 ( 1994-05-01), p. 2156-2160
    Details
    In: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, American Vacuum Society, Vol. 12, No. 3 ( 1994-05-01), p. 2156-2160
    Abstract: This paper elaborates on the idea of using the scanning tunneling microscope in new experiments on thermopower generation by a vacuum-tunneling junction. We first introduce the subject of thermopower generation in metals in the presence of a temperature gradient, emphasizing the physical origins of the thermopower. Then we discuss a thermopower produced in a homogeneous metallic chain containing a tunneling junction. This thermopower is sufficiently large to be measured. Finally, we describe an arrangement to measure the thermopower, especially with the help of the scanning tunneling potentiometry.
    Type of Medium: Online Resource
    ISSN: 1071-1023 , 1520-8567
    URL: Article
    DOI: 10.1116/1.587730
    RVK:
    UA 4922
    Language: English
    Publisher: American Vacuum Society
    Publication Date: 1994
    detail.hit.zdb_id: 3117331-7
    detail.hit.zdb_id: 3117333-0
    detail.hit.zdb_id: 1475429-0
    Location Call Number Limitation Availability
    BibTip Others were also interested in ...
    Online Resource
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