Note: Front Cover -- Ion Beam Processing of materials and Deposition Processes of Protective Coatings -- Copyright Page -- Table of Contents -- Part I: Symposium J on Correlated Effects in Atomic and Cluster Ion Bombardment and Implantation -- E-MRS'95 Symposium J Preface -- E-MRS'95 Symposium C Preface -- Section I. Fundamental Aspects of Cluster Collisions -- Chapter 1. Molecule and cluster bombardment: energy loss, trajectories, and collision cascades -- 1. Introduction -- 2. Stopping and straggling -- 3. Trajectory correlations -- 4. Kinematics of collision cascades -- 5. Concluding remarks -- Acknowledgement -- References -- Chapter 2. Nonlinear transmission sputtering -- 1. Introduction -- 2. Correlated transmission sputtering -- 3. Pair correlations -- 4. Multiple scattering -- 5. Discussion -- Acknowledgement -- References -- Chapter 3. Molecular dynamics study of shock wave generation by cluster impact on solid targets -- 1. Introduction -- 2. The model -- 3. Results and discussions -- 4. Summary -- References -- Chapter 4. Track formation in metals by electronic processes using atomic and cluster ions -- References -- Chapter 5. Atomic and cluster ion bombardment in the electronic stopping power regime: A thermal spike description -- 1. Introduction -- 2. Physical basis -- 3. Results and discussion -- 4. Conclusion -- References -- Section II. Production, Acceleration and Diagnostics of High Intensity Beams and of Molecular Ions a -- Chapter 6. Production, acceleration and diagnostics of high intensity beams -- 1. Introduction -- 2. Methods of ion production from solids -- 3. High current ion sources -- 4. Extraction and ion beam transport -- 5. Diagnosis of high current ion beams -- References -- Chapter 7. Production, acceleration and diagnostics of molecular ions and ionized clusters -- 1. Introduction. , 2. Cluster ion beams produced with a tandem accelerator -- 3. The ORION-TANDEM project -- 4. A macromolecular accelerator -- 5. Conclusion -- Acknowledgement -- References -- Section III. Surface Phenomena, Photon, Electron or Ion Emission, Sputtering -- Chapter 8. Hyperthermal chemistry and cluster collisions -- 1. Introduction -- 2. Experimental -- 3. Gas phase collisions -- 4. C+60surface collisions -- 5. Conclusion -- Acknowledgements -- References -- Chapter 9. A plasma desorption mass spectrometry study of cluster ion formation from group IIA nitrates -- 1· Introduction -- 2. Experimental -- 3. Results and discussion -- 4. Conclusions -- Acknowledgments -- References -- Chapter 10. Sputtering of large size clusters from solids bombarded by high energy cluster ions and fullerenes -- 1. Introduction -- 2. Experimental -- 3. Results and discussion -- 4. Conclusion -- Acknowledgements -- References -- Chapter 11. Acceleration of clusters, collision induced charge exchange at MeV energies and applications for materials science -- 1. Introduction -- 2. Production of negatively charged cluster ions -- 3. The stripping process -- 4. Detection and identification of the high energy clusters -- 5. Measurements and results -- 6. Conclusion -- References -- Chapter 12. The use of coincidence counting mass spectrometry to study the emission and metastable dissociation of cluster ions -- 1. Introduction -- 2. Experimental -- 3. Results and discussion -- 4. Conclusion -- Acknowledgements -- References -- Chapter 13. Secondary electron emission of solids by impact of molecular ions and clusters -- 1. Introduction -- 2. Mechanisms of ion-induced electron emission -- 3. Velocity dependence of electron emission and expected cluster effects -- 4. Large mass projectiles at low velocity -- 5. Small clusters at hyperthermal velocity. , 6. Near-threshold kinetic emission by slow clusters -- 7. Fast molecular ions and clusters -- 8. Conclusion -- Acknowledgements -- References -- Chapter 14. Secondary electron emission from thin carbon foils under hydrogen cluster impact -- 1. Introduction -- 2. Experiment -- 3. Experimental results -- 4. Discussion -- 5. Conclusion -- References -- Part 2. Joint Session, Symposia J and C -- Section IV. Cluster Projectiles in Materials Processing -- Chapter 15. SiO2 film formation at room temperature by gas cluster ion beam oxidation -- 1. Introduction -- 2. Experiments -- 3. Results and discussion -- 4. Conclusion -- Acknowledgements -- References -- Chapter 16. Reactive accelerated cluster erosion (RACE) by ionized cluster beams -- 1. Introduction -- 2. Reactive cluster impact lithography -- 3. RACE microstructuring of diamond -- 4. Silicon and Pyrex glass microstructures -- 5. Conclusions -- References -- Chapter 17. Investigation of damage formation by gas cluster ion bombardment -- 1. Introduction -- 2. High-energy gas cluster ion accelerator and experimental procedure -- 3. Results and discussion -- 4. Conclusions -- References -- Chapter 18. Preparation of C60 single crystalline thin film by ionized cluster beam deposition and ion implantation into single crystalline C60 thin film -- 1. Introduction -- 2. Experimental -- 3. Results and discussion -- Acknowledgements -- References -- Chapter 19. The computer simulation of energetic particle-solid interactions -- 1. Introduction -- 2. Implantation simulation -- 3. Sputtering as an atypical phenomenon -- 4. Surface hump formation in graphite -- 5. Molecular dynamics simulation -- 6. Fullerene (C60)/graphite interaction -- 7. Fullerene (C60)/silicon interaction -- 8. Animation -- 9. Conclusion -- References. , Chapter 20. STM investigation of energetic carbon cluster ion penetration depth into HOPG -- 1. Introduction -- 2. Experimental -- 3. Results -- 4. Discussion -- 5. Summary -- References -- Chapter 21. Atomistic study of defect generation mechanisms in Mo/W superlattices -- 1. Introduction -- 2. Results and discussion -- Acknowledgements -- References -- Section V. Insulating Materials -- Chapter 22. Defect creation induced by GeV ions in MgO containing Na precipitates -- 1. Introduction -- 2. Experimental procedure -- 3. Results and discussion -- 4. Conclusion -- References -- Chapter 23. N+ ion implantation effects on microhardness and adhesion in TiO2 films -- 1. Introduction -- 2. Experimental -- 3. Results and discussion -- 4. Conclusions -- References -- Chapter 24. Conducting polymer synthesis via ion beam induced precursor conversion -- 1. Introduction -- 2. Experimental -- 3. Precursor conversion -- 4. Converted PPV doping -- 5. Conclusion -- References -- Chapter 25. Processing and characterization of ferroelectric thin films by multi-ion-beam sputtering -- 1. Introduction -- 2. Experimental procedure -- 3. Results and discussion -- 4. Conclusions -- Acknowledgements -- References -- Part 3. Symposium C on Pushing the Limits of Ion Beam Processing - From Engineering to Atomic Scale Issues -- Section VI. Silicon - Defects and Damage -- Cahpter 26. TED of boron in the presence of EOR defects: the use of the theory of Ostwald ripening to calculate Si-interstitial supersaturation in the vicinity of extrinsic defects -- 1. Introduction -- 2. Statistical method for quantitative analysis of loop population -- 3. Results and discussion -- 4. Conclusion -- Acknowledgements -- References -- Chapter 27. Observation of vacancy clustering in FZ-Si crystals during in situ electron irradiation in a high voltage electron microscope -- 1. Introduction. , 2. Experiments -- 3. Results -- 4. Discussion -- 5. Conclusion -- Acknowledgements -- References -- Chapter 28. The damage recovery and electrical activation of shallow boron implants in silicon: The effects of high energy implants -- 1. Introduction -- 2. Experimental details -- 3. Results and discussion -- 4. Conclusion -- Acknowledgements -- References -- Cahpter 29. The effect of dose rate on ion implanted impurity profiles in silicon -- 1. Introduction -- 2. Experimental details -- 3. Results and discussion -- 4. Conclusions -- References -- Chapter 30. Damage profiles in as-implanted silicon: fluence dependence -- 1. Introduction -- 2. Experimental -- 3. Results -- 4. Discussion -- 5. Conclusion -- References -- Chapter 31. Dynamic Monte Carlo simulation of nonlinear damage growth during ion implantation of crystalline silicon -- 1. Introduction -- 2. MC simulation code -- 3. Damage growth calculation -- 4. Comparison with experiments -- 5. Conclusions -- Acknowledgments -- References -- Chapter 32. Molecular dynamics study of the fluence dependence of Si sputtering by 1 keV Ar+ ions -- 1. Introduction -- 2. Sample preparation -- 3. Simulation results -- 4. Conclusions -- References -- Chapter 33. Spectroscopic ellipsometry applied to the determination of an ion implantation depth profile -- 1. Introduction -- 2. Experimental setup -- 3. P+ and P2+ implanted thin damaged layer samples -- 4. Ar2+ implanted thick damaged layer samples -- 5. Conclusion -- Acknowledgements -- References -- Cahpter 34. Kinetics of impurity gettering on buried defects created by MeV argon implantation -- 1. Introduction -- 2. Experimental -- 3. Results and discussion -- 4. Conclusions -- References -- Chapter 35. Influence of sample thickness on carrier lifetime modification induced by 4 MeV proton implantation in silicon -- 1. Introduction -- 2. Experimental. , 3. Results and discussion.

Note: Front Cover -- Optical, Electric and Magnetic Properties of Molecules -- Copyright Page -- Table of contents -- Preface -- Acknowledgements -- List of contributors -- Foreword -- The career of A.D. Buckingham -- The scientific publications of A.D. Buckingham -- Chapter 1. The electro-optic Kerr effect -- Review by David A. Dunmur -- Reprinted paper [B13] -- Reprinted paper [B14] -- Chapter 2. Field-gradient induced birefringence: a direct route to molecular quadrupole moments -- Review by Geoffrey L. D. Ritchie -- Addendum: recollections by Raymond L. Disch -- Reprinted paper [B58] -- Chapter 3. Rayleigh and Raman scattering -- Review by Martin Bogaard -- Reprinted paper [B80] -- Reprinted paper [B198] -- Chapter 4. Forces on nuclei -- Review by Anthony Stone -- Reprinted paper [B220] -- Chapter 5. Intermolecular forces and molecular moments -- Review by William Klemperer -- Reprinted paper [B89] -- Chapter 6. Van der Waals molecules -- Review by Tony Legon -- Reprinted paper [B221] -- Chapter 7. Solvent effects in vibrational spectra -- Review by C.G. Gray and C.G. Joslin -- Reprinted paper [B45] -- Chapter 8. Towards rotationally resolved photoelectron spectroscopy -- Review by C.A. de Lange -- Reprinted paper [B 117] -- Chapter 9. Nonlinear optics -- Review by John F. Ward -- Reprinted paper [B 17] -- Reprinted paper [B208] -- Chapter 10. Vibrational optical activity -- Review by Laurence Barron -- Reprinted paper [B276] -- Chapter 11. NMR chemical shifts: theory and experiment -- Review by Cynthia Jameson -- Reprinted paper [B54] -- Chapter 12. Anisotropic NMR -- Review by Elliott Burnell -- Reprinted paper [B55] -- Reprinted paper [B59].

Note: Front Cover -- Ion-Selective Electrode Reviews -- Copyright Page -- Table of Contents -- CHAPTER 1. EDITORIAL -- CHAPTER 2. SOLID CONTACT IN MEMBRANE ION-SELECTIVE ELECTRODES -- 1. INTRODUCTION -- 2. THEORETICAL PART -- 3. LITERATURE REVIEW OF ISEs WITH SOLID INTERNAL CONTACT -- 4. CONCLUSION -- 5. SYMBOLS AND NOTATION -- 6. REFERENCES -- THE AUTHORS -- CHAPTER 3. IMMOBILIZED ENZYME PROBES FOR DETERMINING INHIBITORS -- 1. INTRODUCTION -- 2. CONSTRUCTION OF IMMOBILIZED ENZYME PROBES (I.E.P.) -- 3. PRINCIPES OF OPERATION OF IMMOBILIZED ENZYME PROBES -- 4. IMMOBILIZED ENZYME PROBES FOR STUDYING ENZYME INHIBITION -- 5. IMMOBILIZED ENZYME PROBES FOR DETERMINING INHIBITORS -- 6. DETERMINATION OF SUBSTRATES IN THE PRESENCE OF INHIBITORS -- 7. CONCLUSION -- 8. REFERENCES -- THE AUTHOR -- CHAPTER 4. POTENTIOMETRIC TITRATIONS BASED ON ION-PAIR FORMATION -- 1. INTRODUCTION -- 2. SENSORS FOR POTENTIOMETRIC TITRATIONS -- 3. TITRANTS AND THEIR STANDARDIZATION -- 4. APPLICATIONS -- 5. CONCLUSION -- 6. REFERENCES -- THE AUTHOR -- CHAPTER 5. APPLICATION OF ION-SELECTIVE ELECTRODES IN SOIL SCIENCE -- 1. INTRODUCTION -- 2. SOIL pH -- 3. INTERACTIONS BETWEEN IONS AND SOIL PARTICLES -- 4. PROBLEMS WITH THE LIQUID-JUNCTION POTENTIAL -- 5. ACTIVITY RATIO AND ACTIVITY PRODUCT USING TWO ION-SELECTIVE ELECTRODES -- 6. CHEMISTRY OF SOIL SOLUTIONS -- 7. MICRO-ELECTRODES -- 8. ION-SELECTIVE ELECTRODES AS ANALYTICAL TOOLS -- 9. FURTHER WORK -- 10. REFERENCES -- THE AUTHOR -- CHAPTER 6. APPLICATION OF ION-SELECTIVE ELECTRODES IN REACTION KINETICS AND KINETIC ANALYSIS -- 1. INTRODUCTION -- 2. THEORETICAL PRINCIPLES -- 3. APPLICATIONS -- 4. CONCLUSIONS -- 5. REFERENCES -- THE AUTHORS -- CHAPTER 7. RECENT TITLES - VII -- 1. ELECTRODE DEVELOPMENT AND NEW ELECTRODES, INCLUDING ASPECTS OF SELECTIVITY -- 2. MECHANISTIC, THEORETICAL ASPECTS AND RESPONSE TIMES. , 3. SOLUTION CHEMISTRY AND ISEs -- 4. AUTOMATIC ANALYSIS, FLOW ANALYSIS AND CONTINUOUS MONITORING -- 5. TITRATIONS STANDARD ADDITIONS AND GENERAL METHODOLOGY -- 6. APPLICATIONS OF ISEs (See also Sections 9 and 10.2) -- 7. GLASS AND OTHER pH ELECTRODES : DEVELOPMENT, APPRAISAL, ETC -- 8. GAS-SENSING ELECTRODES : DEVELOPMENT AND NEW SYSTEMS -- 9. APPLICATIONS OF GAS SENSORS -- 10. AMPEROMETRIC, VOLTAMETRIC AND MISCELLANEOUS TYPES OF BIOSENSING -- 11. MODIFIED ELECTRODES FOR PROMOTING SELECTIVITY -- 12. PIEZOELECTRIC SENSORS AND THEIR APPLICATIONS -- 13. REFERENCE ELECTRODES AND LIQUID JUNCTIONS -- 14. BOOKS AND GENERAL REVIEWS -- SUBJECT INDEX -- AUTHOR INDEX.

Note: Literaturangaben

Note: Zusammenfassung in deutscher und englischer Sprache