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  • 1995-1999  (2)
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  • 1
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 67 (1995), S. 194-196 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A secondary discharge was used to enhance chemical nonequilibrium in the boundary layer of a stagnation point flow reactor during the atmospheric pressure deposition of chemically vapor deposited (CVD) diamond with a direct-current (dc) arcjet. The secondary discharge was induced by means of a positive potential on the deposition surface to drive a current through the boundary layer and produce energetic electrons. These electrons can promote superequilibrium concentrations of radicals at the growth surface. It was found that with 3.5 A/cm2 at 115 V in the secondary discharge, the growth rate of diamond in this reactor increased by a factor of 6 as compared with the floating or grounded substrate case. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
    Location Call Number Limitation Availability
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  • 2
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 67 (1995), S. 144-146 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The spatial profile of methyl radical concentration in a hot-filament reactor has been measured using cavity ring-down spectroscopy (CRDS) at a wavelength of 213.9 nm for which the CH3 absorption cross section has been shown to be nearly independent of temperature. Methyl radicals are generated with a 25 mm long tungsten filament heated to 2400 K in a slowly flowing mixture of 0.6% CH4 in H2 (20 Torr total pressure). CRDS is employed to measure CH3 absorbance as a function of a distance perpendicular to the axis of the filament. The CH3 absorbance profiles do not change when the direction of the process gas flow through the reactor is reversed, which indicates cylindrical symmetry of the CH3 distribution about the filament. Consequently, the radial CH3concentration in the reactor is determined by Abel inversion of the CH3 absorbance profile. The CH3concentration peaks ∼4 mm from the filament (1.04×1014molecules/cm3). Methyl radicals decay rapidly as a function of a distance from the filament and disappear about 2 cm from the filament within our present detection sensitivity (3×1012molecules/cm3). © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
    Location Call Number Limitation Availability
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