In:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, American Vacuum Society, Vol. 15, No. 1 ( 1997-01-01), p. 178-179
Abstract:
A recently designed Langmuir trough using a steady-laminar flowing subphase is exploited to support polymer monolayers. The ultrathin poly(methyl methacrylate) (PMMA) films prepared by this technique have been explored as high-resolution electron beam resists. The lithographic exposure conditions of Langmuir–Blodgett PMMA films were investigated and the results of fabricating a 4 in. mask with 0.38 μm in feature linewidth and 0.5 μm in resolution were achieved by using the Jeoptic ZBA-23 electron-beam machine as the exposure tool.
Type of Medium:
Online Resource
ISSN:
1071-1023
,
1520-8567
Language:
English
Publisher:
American Vacuum Society
Publication Date:
1997
detail.hit.zdb_id:
3117331-7
detail.hit.zdb_id:
3117333-0
detail.hit.zdb_id:
1475429-0
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