In:
Journal of Applied Physics, AIP Publishing, Vol. 81, No. 8 ( 1997-04-15), p. 5474-5474
Abstract:
We report on the preparation and characterization of large scale periodic magnetic nanostructures designed as possible candidates for a future application in magnetic data storage technology. The nanostructures are prepared on glass substrates by UHV electron beam evaporation of Fe, Co, or Co/Pt onto periodically patterned photoresist masks followed by a lift-off of the photoresist. The preceding patterning process of the photoresist is achieved by using an interference lithography process in combination with subsequent selective etching. For the exposure of the photoresist, we use two different experimental setups with Ar ion lasers operating at wavelengths of 457 and 244 nm, respectively. This allows us to control diameter as well as distances between magnetic dots ranging between 300 and 3000 nm. The structural characterization of magnetic nanostructures is performed by electron microscopy as well as atomic force microscopy. Magnetic force microscopy along with additional image calculations based on dipole–dipole interaction between a magnetic tip and a magnetic dot allows for an interpretation of the magnetic properties of single magnetic dots. Accompanying work focuses on comparable nanostructures of smaller sized samples prepared by electron-beam lithography.
Type of Medium:
Online Resource
ISSN:
0021-8979
,
1089-7550
Language:
English
Publisher:
AIP Publishing
Publication Date:
1997
detail.hit.zdb_id:
220641-9
detail.hit.zdb_id:
3112-4
detail.hit.zdb_id:
1476463-5
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