In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 35, No. 1B ( 1996-01-01), p. L94-
Abstract:
Using a gas-assisted laser etching system, a digital etching method was demonstrated for Bi-Sr-Ca-Cu-O superconducting thin films. The etched surface was examined using an atomic force microscope. When NF 3 was used as the reactive gas, there was a laser fluence region in which the etching rate was nearly constant. This result suggests the existence of a self-stopping mechanism in the etching process, indicating the possible development of this method into a precise layer-by-layer etching technology for high- T c superconducting materials.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
1996
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
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