In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 34, No. 4A ( 1995-04-01), p. L444-
Abstract:
CF, CF 2 and CF 3 radical densities were investigated in electron cyclotron resonance (ECR) plasma employing C 4 F 8 (octafluoro-cyclobutane) and C 4 F 8 /H 2 gases using infrared diode laser absorption spectroscopy.
It was found that CF 2 radical density in ECR C 4 F 8 plasma was on the order of 10 13 cm -3 at microwave power below 300 W and pressure of 0.4 Pa, which was quite high compared to CF and CF 3 radical densities. With addition of H 2 to C 4 F 8 plasma, CF radical density increased markedly and the CF radical became dominant along with the CF 2 radical. The mechanisms of these behaviors of radicals are discussed on the basis of these experimental results.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.34.L444
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
1995
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
2006801-3
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