In:
Applied Physics Letters, AIP Publishing, Vol. 83, No. 22 ( 2003-12-01), p. 4530-4532
Abstract:
We present a stacked buffer mechanism for heteroepitaxial growth with large lattice mismatch. The stacked buffer consists of constituent layers, which can form coincident lattices at layer/layer and layer/substrate interfaces. For the case of GaN-on-Si(111) heteroepitaxy, we utilize the 1:2 and 5:2 coincident lattices formed at the β-Si3N4(0001)/Si(111) and AlN(0001)/β-Si3N4(0001) interfaces, respectively, to facilitate the double-buffer layer for GaN-on-Si heteroepitaxial growth. By using this buffer technique, we resolve the issue of autodoping resulting from Si outdiffusion when grown with a single AlN(0001) buffer. As a result, the epitaxial quality of GaN film is also significantly improved.
Type of Medium:
Online Resource
ISSN:
0003-6951
,
1077-3118
Language:
English
Publisher:
AIP Publishing
Publication Date:
2003
detail.hit.zdb_id:
211245-0
detail.hit.zdb_id:
1469436-0
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