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  • 1
    Online Resource
    Online Resource
    Operation of rf ovens in ECR ion sources
    AIP Publishing ; 2004
    In:  Review of Scientific Instruments Vol. 75, No. 5 ( 2004-05-01), p. 1446-1448
    Details
    In: Review of Scientific Instruments, AIP Publishing, Vol. 75, No. 5 ( 2004-05-01), p. 1446-1448
    Abstract: A 34-mm-diam rf oven system previously developed on bench [Cavenago, Kulevoy, and Petrenko, Rev. Sci. Instrum. 73, 552 (2002)] was inserted and tested into the electron cyclotron resonance (ECR) ion source Alice, producing beams from natural copper and silver samples; charge range was typically i=10–14 for copper and i=10–19 for silver, which compares well to previous source yield for xenon (charges 11–20). The ion source operation depends on the oven distance Loe from ECR plasma; different crucible materials (tantalum or steel), and oven position Loe=70–105 mm were successfully tried. Moreover another prototype using a robust tungsten rf coil was designed and tested on bench; numerical simulation and experimental results are described.
    Type of Medium: Online Resource
    ISSN: 0034-6748 , 1089-7623
    URL: Article
    DOI: 10.1063/1.1690483
    Language: English
    Publisher: AIP Publishing
    Publication Date: 2004
    detail.hit.zdb_id: 209865-9
    detail.hit.zdb_id: 1472905-2
    SSG: 11
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  • 2
    Online Resource
    Online Resource
    Alice ion source and its high voltage platform
    AIP Publishing ; 2000
    In:  Review of Scientific Instruments Vol. 71, No. 2 ( 2000-02-01), p. 758-760
    Details
    In: Review of Scientific Instruments, AIP Publishing, Vol. 71, No. 2 ( 2000-02-01), p. 758-760
    Abstract: The electron cyclotron resonance ion source Alice is a small 14.4 GHz ion source intended to be a general purpose ion source for the ALPI ion linac. To increase the speed of emitted ions to more than 0.009 c it was installed on a high voltage platform. Noteworthy details of the platform complex such as the 400 kV insulation transformer with the power line connecting it to the platform and the acceleration tube are reviewed. The whole complex can operate up to 350 kV and up to 36 μA of extracted current, the current dispersed is small and upgrading to 400 kV looks possible. Details of the beam current, ion source optimization, source emittance and beam transport are discussed and show good agreement between experiments and calculated beam sizes.
    Type of Medium: Online Resource
    ISSN: 0034-6748 , 1089-7623
    URL: Article
    DOI: 10.1063/1.1150285
    Language: English
    Publisher: AIP Publishing
    Publication Date: 2000
    detail.hit.zdb_id: 209865-9
    detail.hit.zdb_id: 1472905-2
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  • 3
    Online Resource
    Online Resource
    Further development of the E-MEVVA ion source
    AIP Publishing ; 2002
    In:  Review of Scientific Instruments Vol. 73, No. 2 ( 2002-02-01), p. 702-705
    Details
    In: Review of Scientific Instruments, AIP Publishing, Vol. 73, No. 2 ( 2002-02-01), p. 702-705
    Abstract: We report detailed investigations of the electron-beam metal vapor vacuum-arc (E-MEVVA) ion source, which were performed jointly among the Institute for Theoretical and Experimental Physics, Moscow, Russia, the High Current Electronics Institute, Tomsk, Russia, and Brookhaven National Laboratory, USA. The experiments were performed in Moscow and Tomsk with nearly the same design of ion sources. Recently, the first successful ion charge states enhancement for this kind of ion source was demonstrated. This article presents comparisons of electron-beam effects and examines their influence on E-MEVVA performance. Substantial enhancement of high ion charge states enhancement was observed clearly in both experimental setups with two different methods of measuring the ion charge state distributions. These results can be considered as a proof of the E-MEVVA principle.
    Type of Medium: Online Resource
    ISSN: 0034-6748 , 1089-7623
    URL: Article
    DOI: 10.1063/1.1431702
    Language: English
    Publisher: AIP Publishing
    Publication Date: 2002
    detail.hit.zdb_id: 209865-9
    detail.hit.zdb_id: 1472905-2
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  • 4
    Online Resource
    Online Resource
    Electron-beam enhancement of the metal vapor vacuum arc ion source
    AIP Publishing ; 2002
    In:  Journal of Applied Physics Vol. 92, No. 5 ( 2002-09-01), p. 2884-2889
    Details
    In: Journal of Applied Physics, AIP Publishing, Vol. 92, No. 5 ( 2002-09-01), p. 2884-2889
    Abstract: We report detailed investigations of the electron-beam metal vapor vacuum arc (E-MEVVA) ion source. The experiments were performed in Moscow and Tomsk with nearly the same design of ion sources. We recently reported the first conclusive demonstration of electron-beam enhancement of MEVVA performance using lead and bismuth cathodes, which yielded maximum ion charge states of Pb7+ and Bi8+ for E-MEVVA, as compared to Pb2+ and Bi2+ for conventional MEVVA operation. In this article we report extensive results for additional cathode materials, further details of the Moscow and Tomsk ion sources, and a discussion of electron beam effects on E-MEVVA performance. These results can be considered as a proof of the E-MEVVA principle.
    Type of Medium: Online Resource
    ISSN: 0021-8979 , 1089-7550
    URL: Article
    DOI: 10.1063/1.1498956
    Language: English
    Publisher: AIP Publishing
    Publication Date: 2002
    detail.hit.zdb_id: 220641-9
    detail.hit.zdb_id: 3112-4
    detail.hit.zdb_id: 1476463-5
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  • 5
    Online Resource
    Online Resource
    Radio-frequency ovens for ECR ion sources
    AIP Publishing ; 2002
    In:  Review of Scientific Instruments Vol. 73, No. 2 ( 2002-02-01), p. 552-554
    Details
    In: Review of Scientific Instruments, AIP Publishing, Vol. 73, No. 2 ( 2002-02-01), p. 552-554
    Abstract: Radio-frequency (rf) ovens have perspective advantages over their Ohmic equivalent in terms of uniformity of heating, separation (extending lifetime and use of reactive sample) and insulation; on the other side, rf losses in the coil must be minimized. Several geometries, crucibles, and coils were tested to optimize efficiency (power in the sample/total power); the final axial geometry with a copper coil is described, discussing the optimization of thermal contacts. A script to simulate the two-dimensional geometry of a rf oven (in particular, the wire separation and shape) was written; optimal working frequencies were found to be about or over 1 MHz, as confirmed by experiments, while the coil should be slightly longer than the sample. A temperature of 1680 K was reached with an iron crucible and 80 W of total rf power; silver and copper evaporations were tested; and carbon crucibles can reach higher temperatures (1750 K in a preliminary version).
    Type of Medium: Online Resource
    ISSN: 0034-6748 , 1089-7623
    URL: Article
    DOI: 10.1063/1.1429306
    Language: English
    Publisher: AIP Publishing
    Publication Date: 2002
    detail.hit.zdb_id: 209865-9
    detail.hit.zdb_id: 1472905-2
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  • 6
    Online Resource
    Online Resource
    Experiments with rf ovens in ECR ion sources
    AIP Publishing ; 2004
    In:  Review of Scientific Instruments Vol. 75, No. 11 ( 2004-11-01), p. 4934-4943
    Details
    In: Review of Scientific Instruments, AIP Publishing, Vol. 75, No. 11 ( 2004-11-01), p. 4934-4943
    Abstract: A 34 mm diameter radio frequency (rf) oven system previously developed on bench was inserted and tested into the Electron Cyclotron Resonance (ECR) Ion Source Alice, producing beams from natural copper and silver samples; charge range was typically i=10–13 for copper and i=10–19 for silver, which well compares to previous source yield for xenon (charges 11–20). Some issues of oven design, including wire section effects, and circuit matching, are discussed; taps on the coupling transformer improved the flexibility of rf matching to different crucible materials (tantalum or steel). Details of operating experience (cleaning the oven and replacing sample) are reported; sample duration was more than 100 h and temperature Ts in excess of 1750 K were demonstrated. The ion source operation depends on both the oven distance Loe from ECR plasma and the bias voltage Vb of the sample. Best conditions were found for close (Loe≅70 mm) or preferably intermediate positions (Loe≅106 mm) and for sample negative respect to ECR chamber Vb & lt;−400 V. Final results of current for silver [for example I(107Ag17+) about 1000 nA] are well comparable to xenon case [for example I(129Xe18+) about 500 nA] after correcting for isotopic abundance. Memory effect of metal ion generation was also important and is discussed as well as other time dependent effects and an empirical fit for the aggregate results of silver mass flow. New oven prototypes reached Ts≅2250 K in development tests.
    Type of Medium: Online Resource
    ISSN: 0034-6748 , 1089-7623
    URL: Article
    DOI: 10.1063/1.1808914
    Language: English
    Publisher: AIP Publishing
    Publication Date: 2004
    detail.hit.zdb_id: 209865-9
    detail.hit.zdb_id: 1472905-2
    SSG: 11
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  • 7
    Online Resource
    Online Resource
    Highly stripped ion sources for MeV ion implantation
    AIP Publishing ; 2004
    In:  Review of Scientific Instruments Vol. 75, No. 5 ( 2004-05-01), p. 1900-1903
    Details
    In: Review of Scientific Instruments, AIP Publishing, Vol. 75, No. 5 ( 2004-05-01), p. 1900-1903
    Abstract: A joint research and development effort whose ultimate goal is to develop an intense, high charge state, ion source for mega-electron-volt ion implanters has been initiated. Present day high-energy ion implanters utilize low charge state (usually single charge) ion sources in combination with radio frequency (rf) accelerators. Usually, a MeV Linear Accelerator (MV LINAC) is used for acceleration of a few milliamperes. It is desirable to have instead an intense, high charge state ion source on a relatively low energy platform [direct current (dc) acceleration] to generate high-energy ion beams for implantation. This endeavor is a continuation of earlier research, which resulted in generating ions like Pb+7 and Bi+8 and ion currents exceeding 200 mA. The natural next step is to convert and optimize ion charge state enhancement techniques to generate B, P, As, and Sb ions, and adapt them to a dc implanter. A number of schemes are to be pursued simultaneously. The most promising approach is to be developed into a commercial ion source.
    Type of Medium: Online Resource
    ISSN: 0034-6748 , 1089-7623
    URL: Article
    DOI: 10.1063/1.1702116
    Language: English
    Publisher: AIP Publishing
    Publication Date: 2004
    detail.hit.zdb_id: 209865-9
    detail.hit.zdb_id: 1472905-2
    SSG: 11
    Location Call Number Limitation Availability
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