In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 39, No. 1R ( 2000-01-01), p. 320-
Abstract:
A metal-organic deposition (MOD) derived Pb
(Zr 0.53 Ti 0.47 )O 3 thin film was patterned using
magnetically enhanced reactive ion etching (MERIE) which promised a relatively high etching rate, large etch anisotropy and good
selectivity for lead zirconate titanate (PZT). The etched surface of PZT thin films was investigated by X- ray photoelectron spectroscopy
(XPS). It was found that PbF 2 , ZrF 4 and polymers containing
C, H and F were formed and remained on the etched surface while no titanium fluoride was formed during the etching process. The major
factor that restricts the realization of a high etching rate is the removal of PbF 2 . Fluoride that remained on the surface could be
removed by annealing after etching.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
2000
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
Permalink