In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 40, No. 7A ( 2001-07-01), p. L660-
Abstract:
We have reported current–voltage characteristics of Ta/- and Ni/Ta/n-GaN Schottky diodes under various thermal treatments. Experimental data indicate that the electrical characteristics of Ni/Ta diodes are controlled by the interfacial properties of the Ta and GaN heterointerface for the as-deposited samples and strongly affected by the presence of an oxide layer (Ta 2 O 5 ) in those high-temperature-annealed diodes. In regard to Ta/Ni diodes, probably because of thermal stability and wide-band-gap properties of tantalum oxide, dramatic improvement in Schottky diode performance was resulted after annealing at high temperatures. The corresponding barrier height and ideality factor values can reach 1.17 eV and 1.09, respectively, even at an annealing temperature of 800°C.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.40.L660
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
2001
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
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