In:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, American Vacuum Society, Vol. 25, No. 5 ( 2007-09-01), p. 1609-1614
Abstract:
The authors propose a novel post-focused-ion-beam (FIB) treatment method to improve the optical properties of photonic devices fabricated by the Ga+ FIB technique on the silicon substrate with low temperature liquid annealing process. A conventional micrometric ridge waveguide is first fabricated and then annealed to roughly detect the improvement of its optical properties. Then a nanometric 12-fold photonic quasicrystal waveguide is designed to further study its topography variation as well as the subtle influence on its optical properties with different post-FIB treatments. By comparing the experimental results with the theoretical results that are made by means of the three-dimensional finite-difference time-domain method, the authors find that the proposed low temperature liquid annealing method can efficiently improve the optical properties of photonic devices by decreasing Ga+ contamination, removing redeposited Si–SiO2 composites, and restoring damaged silicon lattice structures caused by Ga+ bombardment in the FIB micromachining.
Type of Medium:
Online Resource
ISSN:
1071-1023
,
1520-8567
Language:
English
Publisher:
American Vacuum Society
Publication Date:
2007
detail.hit.zdb_id:
3117331-7
detail.hit.zdb_id:
3117333-0
detail.hit.zdb_id:
1475429-0
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