ISSN:
1089-7623
Quelle:
AIP Digital Archive
Thema:
Physik
,
Elektrotechnik, Elektronik, Nachrichtentechnik
Notizen:
In order to investigate the fundamentals of the deposition of ions with energies in the range of 10–100 eV, we developed Freeman-type hybrid ion source and a low-energy mass-analyzed ion beam deposition system. Analyzing the energy distributions of ions generated, we estimated the properties of the ion source. Energy distributions of noble gas ions (Ne+, Ar+, Kr+, Xe+), and metal ions (Ti+, Fe+, W+, C+) were measured by a PPM421 plasma process monitor with a cylindrical mirror analyzer and a quadrupole mass spectrometer. For instance, Ar+ ions transported at 25 keV were decelerated to 103 eV with an energy spread of ±3 eV, and Ti+ ions generated by sputtering of a titanium target had an energy distribution of 107±3 eV. The energy of ions generated by this apparatus was well defined, and so it is possible to investigate film formation processes by low-energy ions. © 2000 American Institute of Physics.
Materialart:
Digitale Medien
URL:
http://dx.doi.org/10.1063/1.1150417
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