In:
Chemical Vapor Deposition, Wiley, Vol. 16, No. 4-6 ( 2010-06), p. 123-126
Abstract:
Bi 2 O 3 films have been deposited on alumina particles by Fluidized Bed Chemical Vapor Deposition at atmospheric pressure, using bismuth triphenyl and oxygen as precursors. In the operating range tested, the presence of Bi on the whole particles has been evidenced by EDX, and the existence of the α and γ phases of Bi 2 O 3 has been revealed consistently by Raman spectroscopy and by XRD.
Type of Medium:
Online Resource
ISSN:
0948-1907
,
1521-3862
DOI:
10.1002/cvde.v16:4/6
DOI:
10.1002/cvde.200904280
Language:
English
Publisher:
Wiley
Publication Date:
2010
detail.hit.zdb_id:
1477693-5
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