In:
Advanced Materials Research, Trans Tech Publications, Ltd., Vol. 832 ( 2013-11), p. 573-578
Abstract:
In this work, TiO 2 /ZnO nanocomposite films were prepared by simultaneous RF-magnetron sputtering of ZnO and TiO 2 targets. The influences of annealing temperature on the properties of the TiO 2 /ZnO films were investigated. The crystal structure of the deposited TiO 2 /ZnO films was hexagonal wurtzite at (002) and (101) peaks and the films were highly oriented along the c-axis perpendicular to the substrate. The photoluminescence (PL) spectrum reveals the appearance of two emission peaks from the deposited film that are centred at 384 and 591 nm. The structural, electrical, and optical properties of TiO 2 /ZnO films were strongly dependent on the annealing temperature. With increasing of the annealing temperature, the optical properties (i.e., UV, transmittance, energy band-gap and crystalline quality) were also improved. However, when the annealing is relatively high (≥ 500° C), the intensity of the optical properties and crystalline quality slightly decreases. The annealing temperature of (≥ 500° C) becoming the threshold temperature limits for the TiO 2 /ZnO film. The results obtained herein suggest that selecting the appropriate annealing temperature become a key factor for tuning the most desired properties from the as-prepared TiO 2 /ZnO thin films.
Type of Medium:
Online Resource
ISSN:
1662-8985
DOI:
10.4028/www.scientific.net/AMR.832
DOI:
10.4028/www.scientific.net/AMR.832.573
Language:
Unknown
Publisher:
Trans Tech Publications, Ltd.
Publication Date:
2013
detail.hit.zdb_id:
2265002-7
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