In:
Materials Science Forum, Trans Tech Publications, Ltd., Vol. 898 ( 2017-6), p. 1498-1504
Kurzfassung:
Niobium carbide films was deposited by direct current reactive magnetron sputtering on Si (001) substrates in discharging a mixture of CH 4 /Ar gas. The effects of growth temperature ( T s ) and methane flow rate ( F CH4 ) on the phase structure, composition, mechanical and tribological properties for NbC x films were explored. For the film grown at F CH4 =6 sccm, a phase transition from cubic-NbC phase to hexagonal-Nb 2 C phases occurred with increasing the T s ; In contrast, when the film deposited at F CH4 =16 sccm, only the cubic-NbC phase was observed at different T s . The surface of all the films became rough with increasing the T s . In addition, when the T s increased from RT to 600 °C, the films exhibited the compressive stress and kept rising. While as the T s 〉 600 °C, the stress partially relaxed both at F CH4 =6 sccm and F CH4 =16 sccm. The hardness (H) for sample grown at F CH4 =6 sccm first increased up to a maximum value, and then decreased with increasing the T s . And the films grown at F CH4 =16 sccm kept decreasing with the maximum super-hard value of the filmsof 40.5 GPa at F CH4 =6 sccm and 600 °C. The friction coefficient for the film obtained at F CH4 =16 sccm was lower than that at F CH4 =6 sccm, which might be due to the presence more carbon in the film grown at F CH4 =16 sccm.
Materialart:
Online-Ressource
ISSN:
1662-9752
DOI:
10.4028/www.scientific.net/MSF.898
DOI:
10.4028/www.scientific.net/MSF.898.1498
Sprache:
Unbekannt
Verlag:
Trans Tech Publications, Ltd.
Publikationsdatum:
2017
ZDB Id:
2047372-2
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