Keywords:
Solids-Surfaces.
;
Thin films.
;
Electronic books.
Description / Table of Contents:
This book is a conceptual overview of surface and thin film science, providing a basic and straightforward understanding of the most common ideas and methods used in these fields. Fundamental scientific ideas, deposition methods and characterization methods are all examined.
Type of Medium:
Online Resource
Pages:
1 online resource (373 pages)
Edition:
1st ed.
ISBN:
9781482233056
URL:
https://ebookcentral.proquest.com/lib/geomar/detail.action?docID=7121427
DDC:
530.427
Language:
English
Note:
Cover -- Half Title -- Title Page -- Copyright Page -- Dedication -- Table of Contents -- Preface -- Author -- 1. Surfaces and Thin Films -- 1.1 Introduction -- 1.2 Atomic Scale Models -- 1.3 Overview -- References -- 2. Vacuum and Plasma Environments -- 2.1 Kinetic Theory of Gases -- 2.1.1 Ideal Gas Law -- 2.1.2 Pressure and Vacuum -- 2.1.3 Interactions in the Gas -- 2.1.4 Interactions with Surfaces -- 2.1.5 Vapor Pressure -- 2.1.6 Gases vs. Solids -- 2.2 Plasmas -- 2.2.1 Creating a Plasma -- 2.2.2 Characterizing a Plasma -- 2.2.3 Motion of Charges -- 2.2.4 Plasma Sources -- 2.2.5 Chemistry in Plasmas -- 2.2.6 Applications of Plasmas -- 2.3 Cleaning Surfaces -- References -- Problems -- Part I: Surfaces -- 3. Crystal Structure -- 3.1 Structure of Crystals -- 3.2 Reciprocal Lattice -- 3.3 Bonds in Crystals -- 3.4 Defects in Crystals -- 3.5 Ideal Surfaces -- 3.6 Surface Reconstructions -- 3.7 Minimizing Energy -- 3.8 Surface Roughness -- 3.9 Non-Crystalline (Amorphous) Solids -- 3.10 Characterization of Structure -- References -- Problems -- 4. Atomic Motion: Vibrations, Waves, and Diffusion in Solids -- 4.1 Thermal Vibrations -- 4.2 Elastic Waves and Phonons -- 4.2.1 Elastic Waves -- 4.2.2 Phonons -- 4.2.3 Surface Waves and Phonons -- 4.3 Diffusion -- 4.3.1 Bulk Diffusion -- 4.3.2 Surface and Interface Diffusion -- 4.3.3 Surface Roughness -- 4.4 Characterization of Atomic Motion -- References -- Problems -- 5. Thermodynamics -- 5.1 Thermodynamics in Solids -- 5.2 Phase Diagrams -- 5.2.1 One-Component Systems -- 5.2.2 Two-Component Systems -- 5.2.3 Binary Solid Solutions -- 5.2.4 Binary Eutectics -- 5.2.5 Other Considerations -- 5.3 Surface Thermodynamics -- 5.3.1 Surface Energy, Tension, and Stress -- 5.3.2 Minimizing Energy -- 5.3.3 Segregation in Two-Component Systems -- 5.4 Characterization of Thermodynamics -- References -- Problems.
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6. Electrical, Magnetic, Optical, and Thermal Properties -- 6.1 Electrical Properties -- 6.1.1 Free Electron Gas Model -- 6.1.2 Jellium and Nearly Free Electron Model -- 6.1.3 Other Electronic Models -- 6.1.4 Semiconductors -- 6.1.5 Resistivity and Conductivity -- 6.1.6 Surfaces -- 6.1.7 Surface States -- 6.1.8 Excitons and Plasmons -- 6.2 Magnetic Properties -- 6.2.1 Magnetic Materials -- 6.2.2 Ferromagnetic Energies -- 6.2.3 Surface Magnetism -- 6.3 Optical Properties -- 6.3.1 Electromagnetic Waves in Materials -- 6.3.2 Optical Properties at Surfaces -- 6.3.3 Adsorbates on Surfaces -- 6.3.4 Films -- 6.4 Thermal Properties -- 6.4.1 Specific Heat -- 6.4.2 Thermal Conductivity -- 6.4.3 Thermal Expansion -- 6.5 Characterization of Surface and Film Properties -- References -- Problems -- 7. Adsorbed Atoms on Surfaces -- 7.1 Thermodynamics of Adsorbed Atoms -- 7.2 Ordered Structures -- 7.3 Molecular Adsorption -- 7.4 Adsorbate Motions -- 7.5 Characterization of Adsorbed Atoms -- References -- Problems -- Part II: Thin Films -- 8. Overview of Thin Film Growth -- 8.1 Introduction -- 8.2 Homogeneous Nucleation and Growth -- 8.3 Steps in Film Formation -- 8.3.1 Thermal Accommodation -- 8.3.2 Binding and Desorption -- 8.3.3 Surface Diffusion -- 8.3.4 Heterogeneous Nucleation -- 8.3.5 Island Growth -- 8.3.6 Island Coalescence -- 8.3.7 Thicker Films - Zone Models -- 8.4 Deviations from Non-Ideal Structure -- 8.5 Advanced Modelling -- 8.6 Summary and Characterization of Thin Films -- References -- Problems -- 9. Physical Vapor Deposition -- 9.1 Evaporation -- 9.1.1 Source -- 9.1.2 Transport -- 9.1.3 Deposition -- 9.1.4 Evaporation Parameters and Processes -- 9.2 Sputter Deposition -- 9.2.1 Source -- 9.2.2 Transport -- 9.2.3 Deposition -- 9.2.4 DC (Diode) Sputter Deposition -- 9.2.5 RF Sputter Deposition -- 9.2.6 Magnetron Sputter Deposition.
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9.3 Modifications to Physical Vapor Deposition -- 9.3.1 Ion-Assisted Deposition -- 9.3.2 Reactive Deposition -- 9.3.3 Comparison of Evaporation and Sputtering -- 9.4 Molecular Beam Epitaxy and Epitaxial Films -- 9.5 Arc Vaporization - Cathodic Arc Deposition -- 9.5.1 Source -- 9.5.2 Transport -- 9.5.3 Deposition -- 9.6 Pulsed Laser Deposition - Laser Ablation -- 9.6.1 Source -- 9.6.2 Transport -- 9.6.3 Deposition -- References -- Problems -- 10. Chemical Vapor Deposition -- 10.1 Overview and Chemical Reactions -- 10.2 Source -- 10.3 Transport -- 10.4 Deposition -- 10.5 Modifications of CVD -- 10.5.1 Low-Pressure CVD -- 10.5.2 Plasma Enhanced CVD -- 10.5.3 Laser Enhanced CVD -- 10.5.4 Hot Wire CVD -- 10.5.5 Metalorganic CVD -- 10.6 Atomic Layer Deposition -- References -- Problems -- Part III: Characterization of Surfaces and Thin Films -- 11. Characterization: Overview and Imaging Techniques -- 11.1 Overview of Characterization -- 11.2 Imaging Techniques -- 11.2.1 Optical Microscopes -- 11.2.2 Scanning Electron Microscope -- 11.2.3 Transmission Electron Microscope -- 11.2.4 Low Energy Electron Microscope -- 11.2.5 Scanning Probe Microscopes -- References -- Problems -- 12. Characterization: Structural Techniques -- 12.1 X-Ray Diffraction -- 12.2 Low Energy Electron Diffraction -- 12.3 Reflection High Energy Electron Diffraction -- 12.4 X-Ray Reflectivity -- 12.5 Scattering Techniques -- 12.6 Stylus Profilometer -- 12.7 Quartz Crystal Microbalance -- 12.8 Film Density Measurements -- References -- Problems -- 13. Characterization: Chemical and Elemental Techniques -- 13.1 Auger Electron Spectroscopy -- 13.2 Energy and Wavelength Dispersive X-Ray Analysis -- 13.3 X-Ray Photoelectron Spectroscopy -- 13.4 Ultraviolet Photoelectron Spectroscopy -- 13.5 Near-Edge X-Ray Absorption Fine Structure -- 13.6 Secondary Ion Mass Spectrometry.
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13.7 Scattering Techniques -- 13.8 Fourier Transform Infrared Spectroscopy -- 13.9 Raman Spectroscopy -- 13.10 Electron Energy Loss Spectroscopy -- References -- Problems -- 14. Characterization: Electrical, Magnetic, and Optical Techniques -- 14.1 Electrical Characterization -- 14.1.1 Hall Effect -- 14.1.2 Resistivity: Four-Point Probe -- 14.2 Magnetic Characterization -- 14.2.1 Magneto-Optical Kerr Effect -- 14.2.2 Spin-Polarized Electron Techniques -- 14.2.3 Magnetic Force Microscopy -- 14.2.4 Brillouin Light Scattering -- 14.2.5 Magnetometers -- 14.2.6 Ferromagnetic Resonance -- 14.2.7 X-Ray Magnetic Circular Dichroism -- 14.3 Optical Characterization -- 14.3.1 Reflectance -- 14.3.2 Ellipsometry -- 14.3.3 Light Scattering -- 14.3.4 Interferometry -- References -- Problems -- 15. Characterization: Thermodynamic, Thermal, and Mechanical Techniques -- 15.1 Thermodynamic Characterization -- 15.1.1 Surface Tension -- 15.1.2 Surface Adsorption and Desorption -- 15.1.3 Differential Scanning Calorimetry and Thermogravimetric Analysis -- 15.1.4 Diffusion -- 15.2 Thermal Characterization -- 15.2.1 Micro-Thermal Microscopy -- 15.2.2 Photothermal Analysis -- 15.2.3 Cross-Plane Thermal Analysis -- 15.3 Mechanical Characterization -- 15.3.1 Brillouin Light Scattering -- 15.3.2 Stress -- 15.3.3 Friction -- 15.3.4 Microindentation - Nano-indentation -- 15.3.5 Adhesion -- References -- Problems -- Appendix 1: Physical Constants and Unit Conversions -- Appendix 2: Acronyms and Abbreviations -- Appendix 3: Basic Vacuum Technology -- Index.
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