In:
physica status solidi (RRL) – Rapid Research Letters, Wiley, Vol. 14, No. 3 ( 2020-03)
Abstract:
Herein, high‐performance enhancement‐mode (E‐mode) β ‐Ga 2 O 3 metal‐oxide‐semiconductor field‐effect transistors (MOSFETs) are achieved on Si‐doped homoepitaxial films. Oxygen annealing (OA) treatment under the gate region is used to effectively exhaust the channel electron, resulting in the normally off operation of the device. The threshold voltage, defined as that at the drain current of 0.1 mA mm −1 , for the fabricated device is extracted to be 4.1 V. Moreover, double source‐connected field plates are used to suppress the peak electric fields in both Ga 2 O 3 channel and SiN x passivation layer. The fabricated β ‐Ga 2 O 3 MOSFETs with gate‐to‐drain distance ( L gd ) of 17 μm exhibit a record high breakdown voltage over 3000 V. It is shown that the OA treatment is a new way to obtain high‐performance E‐mode β ‐Ga 2 O 3 power MOSFETs.
Type of Medium:
Online Resource
ISSN:
1862-6254
,
1862-6270
DOI:
10.1002/pssr.201900586
Language:
English
Publisher:
Wiley
Publication Date:
2020
detail.hit.zdb_id:
2259465-6
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