In:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, American Vacuum Society, Vol. 33, No. 2 ( 2015-03-01)
Abstract:
This paper reports the investigation of E ↔ H mode transition points and the width of the hysteresis in a re-entrant configuration of inductively coupled plasma. The E → H and H → E transition density and transition power were measured at various plasma pressures, and the E → H transition density is found to have little change at low pressures (ν/ω ≪ 1), but to clearly increase when the argon pressure exceeds a certain value. The E → H transition power versus the pressure shows a minimum transition power at 4 Pa (ν/ω = 1) for argon, and in addition, the reverse H → E transition density exhibits the same trend seen for the E → H transition density, though the H → E transition power shows a decrease with the pressure. In this paper, the width of the hysteresis loop is defined as the difference between the H → E transition power and the E → H transition power, so the hysteresis loop tends to be wider as the pressure increases. This work is useful to understand the E ↔ H mode transition and to control the transition points in real plasma processing.
Type of Medium:
Online Resource
ISSN:
2166-2746
,
2166-2754
Language:
English
Publisher:
American Vacuum Society
Publication Date:
2015
detail.hit.zdb_id:
3117331-7
detail.hit.zdb_id:
1475429-0
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