In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 55, No. 5 ( 2016-05-01), p. 056203-
Abstract:
Thermophysical property of a nanostructured tungsten layer formed on a tungsten film was investigated. A 1-µm-thick tungsten film deposited on a quartz glass substrate was irradiated with a high density helium plasma at the surface temperature of 1500 K. The plasma irradiation led to the formation of highly porous fiberform-nanostructured tungsten layer with a thickness of 3.5 µm. Impulse heating was applied at the interface of the film/substrate, and transient heat diffusion was observed using a pulsed light heating thermoreflectance apparatus. The thermoreflectance signals clearly differed between the nanostructure existing and mechanically removed regions; the difference can be attributed to thermal effusivity of the nanostructured tungsten layer. The estimated thermal conductivity of the nanostructured tungsten decreases to ∼2% of that of bulk when the density of the nanostructure is assumed to be ∼6% of the bulk value.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.7567/JJAP.55.056203
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
2016
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
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