In:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, American Vacuum Society, Vol. 17, No. 1 ( 1999-01-01), p. 206-211
Abstract:
A novel optical multilayer filter with graded refractive index profiles using a quarterwave stack was designed. This filter exhibits a high reflectance band, a sharp cutoff and a wide transmittance region as the result of sidelobe suppression. A 31 layer TiO2/SiO2 high reflectance filter with a graded refractive index profile was fabricated by helicon plasma sputtering on BK7 and Si (100) substrates. The deposition system was operated under ambient gas pressure of 1.8×10−1 Pa at room temperature. The measured transmittance of the spectrum was in good accord with calculated results. Transmission electron microscopic observations confirmed the expected microstructure of the filter.
Type of Medium:
Online Resource
ISSN:
0734-2101
,
1520-8559
Language:
English
Publisher:
American Vacuum Society
Publication Date:
1999
detail.hit.zdb_id:
1475424-1
detail.hit.zdb_id:
797704-9
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